AZO, Zinc Oxide with Alumina doping (ZnO / Al₂O₃, 98/2 wt%,) Sputtering Targets

The standard Cu backing plate thickness is 0.125 inch (3.175 mm). If a different thickness is required, please specify on the order.

Alumina-doped Zinc Oxide (AZO) sputtering targets with high density and small grain sizes are available from MSE Supplies. The purity of AZO Sputtering Targets provided by MSE Supplies is minimum 99.9%.

Both standard size and customized sizes are available upon request.

Typical Sputtering Procedure

Dependent on process. AZO films can be deposited by RF or DC magnetron sputtering, but not by thermal evaporation. If the sputter target is non-conducting, as with a ceramic composition, RF sputter techniques are necessary; otherwise reactive DC magnetron sputtering is preferred.

Target power density ~3-4 W/cm² with an O₂ to Ar flow rate ~2:1.
Operating total pressure ~6 mTorr.
Substrate temperature near 200°C.
Higher power and greater thicknesses produce lower sheet resistances.

Applications

AZO targets are used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Low-E Glass Industry (Architectural glass, Automotive glass)
Thin Film Photovoltaic Industry (TCO)
Flat Panel Displays

Features

High purity and high density
Density >= 5.55 g/cm³
Custom Sizes Available

Material Type	Alumina doped Zinc Oxide
Symbol	Al₂O₃/ZnO 2/98 wt%, AZO
Color/Appearance	Solid in various forms
Melting Point (°C)	N/A

Theoretical Density (g/cc)	5.56
Z Ratio
Sputter	RF-R
Max Power Density (Watts/Square Inch)	20
Type of Bond	Indium

AZO, Zinc Oxide with Alumina doping (ZnO / Al2O3, 98/2 wt%,) Sputtering Targets

AZO, Zinc Oxide with Alumina doping (ZnO / Al₂O₃, 98/2 wt%,) Sputtering Targets