Niobium Carbide (Nb2CTx) MXene Multilayer Nanoflakes
Multilayer Hexagonal Boron Nitride (hBN) Powder, Nano-Size Flakes
Thin Multilayer Hexagonal Boron Nitride (hBN) Powder, Micro-Size Flakes
Moorfield nanoETCH (Benchtop Soft Etch System for Graphene & 2D Materials)
4N 99.99% Zirconium Disulfide (ZrS2) Powder
4N 99.99% Tantalum Disulfide (TaS2) Powder
Tantalum Carbide (Ta4C3Tx) MXene Multilayer Nanoflakes, 1g
Niobium Carbide (Nb4C3Tx) MXene Multilayer Nanoflakes, 1g
Titanium Carbide (Ti2CTx) MXene Multilayer Nanoflakes
Monolayer Hexagonal Boron Nitride (hBN) Film on Copper (Cu) Substrate
Chemical Vapor Deposition (CVD) Continuous Rhenium Diselenide (ReSe2) Film
Chemical Vapor Deposition (CVD) Continuous Rhenium Disulfide (ReS2) Film
Chemical Vapor Deposition (CVD) Continuous Tin Diselenide (SnSe2) Film
Chemical Vapor Deposition (CVD) Continuous Tin Disulfide (SnS2) Film
Chemical Vapor Deposition (CVD) Monolayer Tungsten Diselenide (WSe2) Film
>99% Violet Phosphorus Powder
>99% Violet Phosphorus Crystal, 200mg
Chemical Vapor Deposition (CVD) Molybdenum Telluride (MoTe2) Film
Chemical Vapor Deposition (CVD) Monolayer Molybdenum Diselenide (MoSe2) Film