MSE Supplies offers ANNEAL from Moorfield. It is a benchtop high-temperature vacuum annealing system for planar substrates, with precision gas and pressure control. It is optimized for the thermal treatment of 2D materials and thin film devices under controlled atmospheres.

Substrates are supported face-up on stage-top platens that are situated centrally inside a stainless-steel high-vacuum chamber fitted with appropriate heat shielding and a shuttered viewport. Heating is via a heat source located beneath the platen. Maximum temperatures up to 1000°C are possible—depending on the heating technology used:

Quartz lamp: This technology uses quartz lamps to generate IR radiation. A cost-effective means of heating for substrate temperatures up to 600°C, and compatible with most atmospheres.
Carbon-carbon composite (CCC): Where substrate temperatures above 500°C are required, CCC elements are used where non-oxygen compatible atmospheres are present. Suitable for heating up to 1000°C.
SiC-coated graphite: When high temperatures and oxygen resistance are required, graphite elements are coated with a resistant layer of Silicon Carbide (SiC).
Heating control resolution is ±1°C.

For annealing under controlled atmospheres, ANNEAL systems can be fitted with up to 3 mass flow controllers (MFCs). Typical gases are Argon (Ar), O₂ and N₂, and full scale flow rates are flexible. All systems have wide-range gauges, but for improved accuracy, capacitance manometers are also available. In case chamber pressure is critical, automatic pressure control is available with control resolution to 0.1 mbar.

ANNEAL systems are highly modular and can be configured for a wide range of applications.

Country of Origin: Made in UK

Manufacturer: Moorfield Nanotechnology

Main Features:

Benchtop configuration
Up to 6” substrate diameters
Stage temperatures up to 1000 °C
Choice of heating technologies
MFCs for process gas introduction
Precise pressure control
Turbomolecular/mechanical pumping systems
Base pressures < 5 × 10^-7 mbar
Easy sample access
Easy operation via touchscreen HMI
Define/save multiple process recipes
Straightforward maintenance/servicing
Comprehensive safety features
Cleanroom compatible
Proven performance

Options:

4″/6″ diameter substrate stages
Quartz lamp heating up to 600°C
Resistive element heating up to 1000°C
MFCs for process gas introduction
Turbomolecular/mechanical pumping system
Automatic pressure control

For accessories and consumables, please contact us so we can help you choose appropriate products for your needs.

About Moorfield: Moorfield was incorporated in 1995. Moorfield are a team of scientists and engineers specializing in the design, manufacture, supply, and support of vacuum deposition (PVD and CVD), etching and annealing systems. The systems manufactured by Moorfield are applied for research, product development and batch production. Applications include semiconductors, photovoltaics, superconductors, sensors, optics, graphene and 2D materials. Academic and industrial markets are served worldwide, both direct and through a network of authorized, trained representatives.

MSE Supplies is an authorized distributor for Moorfield Nanotechnology in the USA.