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Nickel Silicide Sputtering Target NiSi,  MSE Supplies

Nickel Silicide Sputtering Target NiSi

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Nickel Silicide (NiSi) Sputtering Target

Product SKU: TA7594 – TA7597
CAS#: NA
Molar Mass: 86.778 g/mol
Density: NA g/cm3
Melting Point: 966 °C
Shape: Discs, Rectangle, Step, Plates, Sheets, Rods, Custom-Made
Dimension: Diameter (200mm), Length (300mm), Width (200mm), Thickness (1mm), Custom-Made

MSE Supplies is a premier supplier of quality manufactured sputtering targets; we supply custom chemical compositions, purity and sizes. Our wide variety of targets are grouped by high purity metals, alloys, ceramics, and doped. Our pricing is competitive and we consistently offer price matching for our customers

Nickel silicides have been used as electronic materials such as contacts for field effect transistors (FET), interconnects and in nanoelectronic devices.

NiSi is a low resistance compensated metal. Previous electrical and Hall probe measurements, especially on the single crystal specimen, of NiSi revealed two interesting properties: (a) very small resistivity of ~ 10 micro Ohm cm at room temperature, and (b) the change in the nature of the charge carrier at T~ 40 K. The sign of Hall coefficient, RH, changes from negative, at T >= 40 K, to positive at T <= 40 K. This is not unusual in metals and also frequently occurs in compensated semimetals.

MSE Supplies is a premier supplier of quality manufactured sputtering targets; we supply custom chemical compositions, purity and sizes. Our wide variety of targets are grouped by high purity metals, alloys, ceramics, and doped. Our pricing is competitive and we consistently offer price matching for our customers


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