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Nickel Oxide Sputtering Target NiO

Nickel Oxide Sputtering Target NiO

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Nickel Oxide Sputtering Target NiO Features

 

  • Purity: 99.9%              
  • Density: 7.45g/cm3
  • Refractive Index---2~2.1        
  • Melting Point: 1410℃
  • Transparency Wave Band----0.52 
  • Shape: Discs, Plate,Step (Dia 200mm,,  Thickness 1mm)Rectangle, Sheet, Step (Length 300mm, Width 200mm, Thickness 1mm)

Nickel Oxide (NiO) Evaporation Material 

 

  • Purity: 99.5%, 99.9%
  • Refractive Index: 2-2.1
  • Transparence Wave Band: 0.52um
  • Shape: Ø10      
  • Density: 7.45g/cm3
  • Melting Point: 1990℃

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