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MSE PRO Chemical Vapor Deposition (CVD) Molybdenum Telluride (MoTe2) Film

  • $ 44995
  • Save $ 5400


MSE PRO™ Chemical Vapor Deposition (CVD) Molybdenum Telluride (MoTe2) Film

  • Film: Monolayer Molybdenum Telluride (MoTe2)
  • Substrate: Sapphire (SU5005) or SiO2/Si with 300nm SiO2 (SU5006)
  • Size: 10x10mm
  • MoTe2: ~10 layers
  • Polishing: Single Side Polished (SSP)

Applications

Two-dimensional (2D) transition metal dichalcogenides (TMDs) have attracted increasing attention owing to their diverse properties ranging from insulator to metal and promising for wide applications. TMDs and their 2D van der Waals heterostructures have been proposed and demonstrated in various applications, such as electronics, optoelectronics, photonics and photovoltaics.

The  1T′  phase  MoTe2  has  a  monoclinic  structure (distorted octahedral), which  can  be  considered  as  a distortion  from  1T MoTe2, being  driven  by  the  Peierls  distortion. 1T′ MoTe2 has recently sparked great interest due to its novel features, such as large magnetoresistance, pressure-driven superconductivity and feasibility for phase engineering. Two dimensional 1T′ MoTe2 is predicted to be a class of large-gap quantum spin Hall insulators, and can be used in a topological field effect transistor, which makes use of the topological phase transition to realize fast on/off switching.

We can offer MoTe2 film on substrates, such as sapphire, Si, Si/SiO2, quartz etc. Substrate size is also customizable. Please contact MSE Supplies if you need bulk pricing or customization.

References

1. Synthesis of High-Quality Large-Area Homogenous 1T′ MoTe2 from Chemical Vapor Deposition, Adv. Mater., 28: 9526-9531

2. Direct Vapor Deposition Growth of 1T′ MoTe2 on Carbon Cloth for Electrocatalytic Hydrogen Evolution, ACS Appl. Energy Mater. 2020, 3, 4, 3212–3219

3. Temperature-driven topological transition in 1T'-MoTe2, npj Quant Mater 32 (2018)