MSE PRO 2 inch Mg-doped P-type GaN 4 um Gallium Nitride Template on Sapphire (0001)
Features for 2 in Mg-doped P-type Gallium Nitride Template on Sapphire SubstrateProduct SKU#: WA0207 for SSP, WA0248 for DSP
- Conductivity type: P-Type ( Mg-doped)
- Dimension: 50.8 mm +/- 0.2 mm (2 inch diameter)
- GaN Thickness: 4.5 +/- 0.5 um
- GaN Surface Roughness: Ra < 0.5nm after CMP
- Usable area: >90%
- Orientation of GaN: C plane (0001) off angle toward A-axis 0.2 ± 0.1
- Orientation Flat of GaN: (1-100) +/- 0.2 deg, length 16.0 +/- 1.0 mm
- Total Thickness Variation: <15 um
- Resistivity (300K): ~10 Ohm-cm
- Dislocation Density: < 5x108 cm-2
- Carrier Concentration: > 6x1016 cm-3
- Sapphire substrate thickness: 430 +/- 25 um
- Orientation of sapphire substrate: C plane (0001) off angle toward M-axis 0.2 ± 0.1
- Orientation Flat of sapphire: (11-20) 0 ± 0.2 deg, length 16.0 +/- 1.0 mm
- Substrate Structure: GaN/Sapphire (0001)
- Polishing of sapphire substrate: single side polished (SSP) or double size polished (DSP).
- Package: packaged in a clean room environment, in cassettes or single wafer containers.
1. Thermal Annealing Effects on P-Type Mg-Doped GaN Films
Low-resistivity p-type GaN films were obtained by N2-ambient thermal annealing at temperatures above 700 C for the first time.
Thermal Annealing Effects on P-Type Mg-Doped GaN Films. Available from: https://www.researchgate.net/publication/248677447_Thermal_Annealing_Effects_on_P-Type_Mg-Doped_GaN_Films.
2. Optical characterization of Mg-doped GaN films grown by metal organic chemical vapor phase deposition
Scanning electron microscopy, micro-Raman, and photoluminescence (PL)measurements are reported for Mg-doped GaN films grown on (0001) sapphire substrates by low-pressure metal organic chemical vapor phase deposition. The surface morphology, structural, and optical properties of GaN samples with Mg concentrations ranging from 1E19 to 1E21 cm3 have been studied. In the scanning micro graphs large triangular pyramids are observed, probably due to stacking fault formation and three-dimensional growth. The density and size of these structures increase with the amount of magnesium incorporated in the samples. In the photoluminescence spectra, intense lines were found at 3.36 and 3.31 eV on the triangular regions, where the presence of cubic inclusions was confirmed by micro-Raman measurements. The excitation dependence and temperature behavior of these lines enable us to identify their excitonic nature. From our study we conclude that the interface region between these defects and the surrounding wurtzite GaN could be responsible for PL lines
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