Thank you!

Your quote has been successfully submitted!

For products requiring additional information, our team will contact you within 1 business day

Failed

There was an error submitting your quote. Please try again.

Anric Technologies Benchtop Atomic Layer Deposition (ALD) System AT410– MSE Supplies LLC

Free Shipping on MSE PRO Online Orders of $500 or More! U.S. Orders Only * Offer Excludes Hazmat Shipments *

Menu

Anric Technologies Benchtop Atomic Layer Deposition (ALD) System AT410

SKU: AN-AT410

To better serve you, we would like to discuss your specific requirement.
Please Contact Us for a quote.

SKU#: AN-AT410

Atomic Layer Deposition (ALD) is a powerful thin-film deposition technique. Compared to traditional Chemical Vapor Deposition (CVD), ALD allows even higher quality surface layer with nearly pinhole-free, excellent uniformity and conformal (coating and backside, filling holes even in porous substrates). These advantages are related to its controllable process. The whole process is continuous and self-limiting, which means the material in the chamber is slowly deposited by a precursor separately in single atomic layer at a time and the steps are repeated until achieving desired thickness. It is widely used in electronic, biomedical, photovoltaic and other applications.

MSE Supplies offers the Benchtop Atomic Layer Deposition System AT410 from Anric Technologies. 

The AT410 is the most cost-effective thermal ALD tool on the market with customizable chucks/platen of chambers (for 3D parts). It is specially designed for simple operation and installation with a focus on research and development labs and metrology markets, where small size and cost effectiveness are the largest concerns.

AT410 has fast cycling capability (up to 1.2nm/min Al2O3) and high exposure, deep penetration processing available. It has smallest footprint on market (2.5 sq ft), bench top installation and cleanroom compatible. 

Country of Origin: Made in USA

Manufacturer: Anric Technologies

Main Features:

Options:

Please contact us for vacuum pump options.

Specifications

Process Flow / Chamber Geometry Cross flow with point source and flow optimized chamber shape

Chamber temperatures

RT to 320°C ± 1 °C

Precursor temperatures

RT to 150°C ± 2°C (w/ heating jacket), can upgrade to 180°C 

Vacuum Pumping (min) 15 cfm, (pump recommended to be 3-4ft from machine) PFPE oil required (dry pump option)
Typical Operating Pressure 200 mtorr
Dimensions 23” (586mm) wide, 23” (586mm) deep, 15” (405mm) tall
Weight ~100lb (45kg)
Required Power 110-120 VAC, single phase, 50/60Hz; 15Amp

About Anric Technologies: Anric Technologies was founded in 2014 by researchers from Harvard University to address the gap in the market for benchtop ALD tools designed and optimized for small samples and small budgets.

MSE Supplies is an authorized distributor of Anric Technologies for USA and Canada.