The large etch cell setup
One of the most common application of an electrochemical etching cell is a preparation of Nanocrystalline Porous Silicon Layer on a single crystal Si wafer.
Application note:
To perform an electrochemical process, a square conducting sample is placed on the cell base, using a piece of aluminum foil as a back contact. The setup is sealed by an O-ring to prevent the electrolyte leakage. The cell is filled with an electrolyte and the wire electrode is immersed in the solution as a counter electrode. An electric current is passed between the aluminum back contact and the wire electrode for a certain amount of time. After the process, the cell elements should be washed several times with ethanol and dried under the nitrogen flow.
Specification:
nominal exposure area: 8.6 cm2
electrolyte volume: 15 mL
minimum sample size: 38 mm x 38 mm
maximum sample width: 45 mm
Setup includes:
1 x The Large Magnetic Mount Etch Cell (or The Large Etch Cell)
1 x Spiral Wire Electrode – 50SP17 0.6/191mm