SKU#: AN-AT200M

Atomic Layer Deposition (ALD) is a powerful thin-film deposition technique. Comparing to traditional Chemical Vapor Deposition (CVD), ALD allows even higher quality surface layer with nearly pinhole-free and excellent uniformity. These advantages are related to its controllable process. The whole process is continuous and self-limiting, which means the material in the chamber is slowly deposited by precursor separately in single atomic layer and the steps are repeated until achieving desired thickness. It is widely used in electronic, biomedical, photovoltaic and other applications.

MSE Supplies offers the Benchtop Atomic Layer Deposition System AT200M from Anric Technologies. 

AT200M is the smallest footprint ALD system available on the market. It is specially designed for simple operation and installation with a focus on educational and metrology markets, where small size and cost effectiveness are the largest concerns. When working with samples that dictate glovebox usage, such as sulfides, the compact nature of the AT200M turns this into a trivial matter. AT200M utilizes semiconductor grade components, metal sealed lines, and a robust programmable logic controller (PLC) driven user interface that yields fast cycling and high quality single component thin films while still realizing easy maintenance and safe, repeatable operation. 

The AT200M is also helpful for TEM applications as trenches can be effortlessly filled with a thin ALD oxide, typically HfO₂, and then cross-sectioned. The high atomic number of Hf provides excellent contrast in TEM. The unobtrusive footprint of the AT200M matches that of evaporators commonly used with SEM/TEM.

Country of Origin: Made in USA

Manufacturer: Anric Technologies

Main Features:

• Small Footprint Benchtop Thermal ALD System W: 14” (35.5cm) x D: 15” (38.1cm) x H: 14.5” (36.8cm) 
• Fits in a Glovebox 
• Stocked for immediate shipment. 
• Accommodates samples from 5.08cm x 5.08cm x 7.62cm (2in x 2in x 3in) or 2in wafers (customizable chucks). 
• 2 precursor ports with heat traced lines. 
• Vented precursor enclosure. 
• High temperature compatible fast pulsing ALD valves with ultrafast MFC for integrated inert gas purge. 
• Up to 2 heated precursors up to 150°C. 
• All stainless steel chamber with temperature range up to 275°C. 
• High exposure available with static processing mode. 
  
• 5" display with integrated PLC control. 
• Lifetime software upgrades included. 
• 1 year warranty (parts and labor included). 
• 3 years process support

Options: Vacuum pump | Ozone generator (ATOzone)[required for SiO2, low temp. Pt, Ir, MoO2, high quality Al2O3 below 60C and high quality HfO2] | Bottle heater | Custom chucks/holders (2x2 inch wafers also available) | ALD precursors | 4 precursor option | Remote software control | QCM | Door for QCM (w/o QCM) | Powder coat option (10 micron powders or larger)

Please contact us for vacuum pump options.

Technical Specifications

*Requires ozone (ATOzone)

Note: For materials not mentioned in this table, please contact us

About Anric Technologies: Anric Technologies was founded in 2014 by researchers from Harvard University to address the gap in the market for benchtop ALD tools designed and optimized for small samples and small budgets.

MSE Supplies is an authorized distributor of Anric Technologies for USA and Canada.