Titanium Aluminum Sputtering Target TiAl

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Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application.

  • Purity: Al-Ti 35/65 at% Al/Ti 50/50 at%, 99.95%, 99.5%
  • Shape: Discs, Plate, Step (Dia 300mm, Thickness 1mm) Rectangle, Sheet, Step (Length 1000mm, Width 300mm, Thickness 1mm) Tube(Diameter< 300mm, Thickness >2mm )
  • Application: Primary used in tools coating, Non-corrosion Valve/Chemical Plants, Marine Industry.