Coating Equipment
- Physical vapor deposition (PVD)-Sputter coating and thermal evaporation are the two most common PVD methods. They can deposit various materials such as metals, ceramics and even organic materials. PVD is widely used in SEM sample preparation and semiconductor devices fabrication.
- Chemical vapor deposition (CVD)- commonly used for production of graphene and other 2D materials.
- Applications:
- SEM sample preparation: cost-effective and easy to operation devices: Compact Magnetron Ion Sputtering Coater or High Vacuum Magnetron Ion Sputtering Coater
- High quality thin film deposition coatings for metals, ceramics or both: high performance compact sputter coating system Moorfield nanoPVD-S10A
- High quality thin film deposition coatings for metals, organics or both: high performance compact thermal evaporation system Moorfield nanoPVD-T15A
- Graphene growth: precise control system Moorfield nanoCVD-8G
- Other 2D materials deposition: desktop automatic layer deposition (ALD) system Anric Technologies Benchtop ALD system
