The standard etch cell setup
One of the most common application of an electrochemical etching cell is a preparation of Nanocrystalline Porous Silicon Layer on a single crystal Si wafer.
To perform an electrochemical process, a square conducting sample is placed on the cell base, using a piece of aluminum foil as a back contact. The setup is sealed by an O-ring to prevent the electrolyte leakage. The cell is filled with an electrolyte and the wire electrode is immersed in the solution as a counter electrode. An electric current is passed between the aluminum back contact and the wire electrode for a certain amount of time. After the process, the cell elements should be washed several times with ethanol and dried under the nitrogen flow.
nominal exposure area: 1.20 cm2
electrolyte volume: 4.8 mL
minimum sample size: 20 mm x 20 mm
maximum sample width: 31 mm
1 x The Standard Magnetic Mount Etch Cell (or The Standard Etch Cell)
1 x Spiral Wire Electrode – 50SP17 0.6/191mm
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