Specifications for Indium Tin Oxide (ITO) Sputtering Target

To add a Cu Backing Plate with Indium Bonding for Sputtering Targets

Indium Oxide/Tin Oxide (In₂O₃/SnO₂90/10 wt%,), ITO, is among one of the most popular sputtering target materials used in the thin film industry due to its electrical conductivity and optical transparency. Specifically, the 90/10 wt%, composition has a melting point of approximately 1,800°C and a density of 7.14 g/cm³. The color of various ITO compounds range from pale yellow to dark green or dark grey. It is evaporated or sputtered under vacuum to generate transparent conductive layers in the manufacture of LCDs and various optical coatings. Thin films of ITO are created for the development of sensors, as well as, a glass coating for the automotive industry.

For ITO coated glass substrates and ITO coated PET films, please click here to order.

Indium Tin Oxide Sputtering Targets ITO Features and Specifications

Chemical Composition: In₂O₃ • SnO₂ (90:10 wt%,)
Color: Black
Purity: > 99.99%
Relative density: more than 99.2%
Resistance: 1 x 10^-4 Oh-cm
Coefficient of Thermal Expansion (CTE): 8 x 10^-6 / K
Sputter: RF, DC
Max power density: 20 Watts per square inch
Bonding available: indium bonding to oxygen free copper backing plate

Customized ITO sputtering targets (special sizes, compositions, backing plate, etc.) are available. Please contact us for details.