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Tungsten Titanium Sputtering Target WTi

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Product Name Tungsten titanium sputtering target WTi
Purity 99.99% 4N, 99.999% 5N
Impurity content <0.01%
Grain Size <100 um
Shape
  • Ingot
  • Sputtering Targets
  • Disk
  • Plate
  • Sheet
  • Foil
  • Wire
  • According to your request
Available size Round: dia 25~400mm Rectangular: length up to 1500mm
Customization is available
Application Widely used in coating processing industries such as optical data storage application and film coating.
Advantage
  • High purity low content of impurities
  • Better heat dissipation
  • High hard texture
  • High tensile strength
Certificates ISO9001:2008 SGS, the third test report

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