Thank you!

Your quote has been successfully submitted!

For products requiring additional information, our team will contact you within 1 business day

Failed

There was an error submitting your quote. Please try again.

MSE PRO 2 inch Semi-Insulating Fe-doped GaN 2 um Gallium Nitride Templ– MSE Supplies LLC

Free Shipping on MSE PRO Online Orders of $500 or More! U.S. Orders Only * Offer Excludes Hazmat Shipments *

Menu

This product has been added to the cart.

MSE PRO 2 inch Semi-Insulating Fe-doped GaN 2 um Gallium Nitride Template on Sapphire (0001)

SKU: WA0203

  • £44700
  • Save £5500



Product Description: 2 inch Semi-Insulating Fe-doped GaN 2 um Gallium Nitride Template on Sapphire (0001), SSP

Product SKU#: WA0203

Specifications:

  • Conductivity type: semi-insulating
  • Doping type: Fe compensated (iron-doped)
  • Fe-doping concentration: 1019 cm3
  • Dimension: 50.8 mm +/- 0.1 mm (2 inch diameter)
  • GaN Thickness: 1.7~2.0 micron (typical thickness 1.8 um)
  • Usable Area: >90%
  • Bow: less than +/- 40 um
  • Orientation: C plane (0001) +/- 0.5 deg
  • Primary Orientation Flat: (1-100) +/- 0.5 degree, length 16.0 +/- 1.0 mm
  • Secondary Orientation Flat: (11-20) +/- 3 degree, length 8.0 +/- 1.0 mm
  • Total Substrate Thickness Variation: <15 um
  • Resistivity (300K): >1x10Ohm-cm
  • Dislocation Density: < 5x108 cm-2
  • Substrate Structure: GaN on Sapphire (0001)
  • Rocking Curve XRD: full width at half maximum (FWHM) XRD (102) < 300 arcsec (typical value less than 200), XRD (002) < 200 arcsec (typical value less than 100)

  • Sapphire substrate thickness: 430 +/- 25 um

  • Orientation of sapphire substrate: C plane (0001) off angle toward M-axis 0.2 ± 0.1
  • Orientation Flat of sapphire: (11-20) 0 ± 0.2 deg, length 16.0 +/- 1.0 mm
  • Polishing: single side polished (SSP) to Ra < 0.5 nm with CMP, epi-ready
  • Package: packed in a class 1000 clean room environment in cassettes of single wafer containers.

Related Reference

Semi-insulating GaN substrates for high-frequency device fabrication

Abstract

Thick c-plane unintentional doped and iron-doped GaN substrates were grown by hydride vapor phase epitaxial technique on sapphire substrates. The morphology and crystalline quality of the freestanding samples show no evident degradation due to iron doping. Low-temperature photoluminescence measurements show reduction of the exciton-bound to neutral impurities band intensities with iron doping increase. Near-infrared photoluminescence studies confirm the incorporation and activation of iron impurities. Variable temperature resistivity measurements verified that the iron-doped films are semi-insulating.