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Bismuth Ferrite Sputtering Target BiFeO<sub>3</sub>,  MSE Supplies

Bismuth Ferrite Sputtering Target BiFeO3

  • £65500


Specifications for Bismuth Ferrite Sputtering Target

To add a Cu Backing Plate with Indium Bonding for Sputtering Targets  

Product Name

BiFeOsputtering target

Formula

BiFeO3

Purity 99.99% 4N
Impurity content <0.01%
Grain Size <1000 um
Technics Powder metallurgy
Shape Sputtering Targets, Disk, Plate, according to your request
Available size Round: dia 25~250mm, Customization is available
Application Widely used in coating processing industries such as optical data storage application and film coating.
Advantage High purity low content of impurities
Better heat dissipation
High hard texture
High tensile strength
Purity 99.9%

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