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MSE PRO Silicon Dioxide Sputtering Target SiO2
SKU: TA3506
Silicon Dioxide (SiO2) Sputtering Target
To add a Cu Backing Plate with Indium Bonding for Sputtering Targets 
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Form: |
Fused Silica, Amorphous |
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CAS#: |
7631-86-9 |
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Molar Mass: |
60.08 g/mol (anhydrous) |
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Density: |
2.2 g/cm3 |
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Melting Point: |
1,713 °C |
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Shape: |
Discs, Rectangle, Step, Plates, Sheets, Rods, Custom-Made |
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Dimension: |
Diameter (200mm), Length (300mm), Width (200mm), Thickness (1mm), Custom-Made |
MSE Supplies is a premier supplier of quality manufactured sputtering targets; we supply custom chemical compositions, purity and sizes. Our wide variety of targets are grouped by high purity metals, alloys, ceramics, and doped. Our pricing is competitive and we consistently offer price matching for our customers.
Typical Analysis
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Physical Properties |
|
|
Parameter |
Specifications |
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Size |
Various |
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Purity |
99.99% |
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Chemical Analysis via ICP-AES |
|
|
Element |
Value (ppm) |
|
Nb |
10 |
|
Fe |
23 |
|
Al |
15 |
|
Mg |
6 |
|
Na |
6 |
|
K |
12 |
|
Ca |
13 |