MSE PRO Microwave Plasma Cleaner
MSE PRO™ Microwave Plasma Cleaner
MSE Supplies offers Microwave Plasma Cleaner. Microwave plasma cleaning and ashing (descumming) process is an advanced dry process using common industrial gases as raw materials, such as oxygen, nitrogen, argon, carbon tetrafluoride and many other gases. This process is rather environmentally friendly and efficient in cleaning; therefore, it has been promoted by more and more industry users. Our system can accommodate wafers up to 8 inch in diameter. It is suitable for wafer dry ashing or wafer surface activation and other batch processes. It is widely used in surface treatment related applications like automobiles, batteries, biomaterials, etc.
Applications:
- Batch wafer surface activation
- Batch wafer photoresist removal
- Removal of MEMS sacrificial layers
- DESCUM process
Technical Specifications
| Dimension (W x D x H) | 900mm x 900mm x 750mm |
| Weight | ~200kg |
| Chamber Material | Quartz chamber |
| Chamber Dimension (φ x D) | 150mm x 260mm |
| Power | 110V/60Hz |
| Microwave Source | 2.45GHz microwave, 1250W |
| Process Gas Line | MFC control (standard: 2 channels), customizable |
| Flow Rate |
100SCCM (O2/Ar) |
| Vacuum Level | 30-90Pa |
*Vacuum pump and water chiller NOT included. Please contact us for detailed specification and optional items.