MSE PRO Desktop Microwave Plasma Asher System
To better serve you, we would like to discuss your specific requirement, Please Contact Us for a quote.
MSE Supplies offers Desktop Microwave Plasma Asher System. Microwave plasma cleaning and ashing (descumming) process is an advanced dry process using common industrial gases as raw materials, such as oxygen, nitrogen, argon, carbon tetrafluoride and many other gases. This process is rather environmentally friendly and efficient in cleaning; therefore, it has been promoted by more and more industry users. Our system can accommodate wafers up to 8 inch in diameter. It is suitable for wafer dry ashing or wafer surface activation and other batch processes. It is widely used in surface treatment related applications like automobiles, batteries, biomaterials, etc.
- Batch wafer surface activation
- Batch wafer photoresist removal
- Removal of MEMS sacrificial layers
- DESCUM process
|Dimension (W x D x H)||690mm x 630mm x 620mm|
|Weight||~50kg (without vacuum pump)|
|Chamber Material||Quartz chamber with drawer type aluminum chamber door|
|Chamber Dimension (φ x D)||250mm x 330mm|
|Power||380~420VAC , 3 phase ; 50/60Hz|
|Microwave Source||2.45GHz microwave, 100~1200W continuous and adjustable|
|Process Gas Line||MFC control (standard: 2 channels), maximum support for 4 channels.|
|Dry Compressed Air||0.5~0.6MPa|
|Vacuum Gauge||Pirani with measuring range 1~1E5 Pa|
|Vacuum Valve||Electronic pneumatic valve|
|Vacuum Pump||Dry pump (standard) ; Oil pump (optional)|
*Pleas contact us for detail specification and optional items.
We Also Recommend