MSE PRO Boron Doped Diamond Electrode on Niobium (BDD/Nb Electrode)
MSE PRO™ Boron Doped Diamond Electrode on Niobium (BDD/Nb Electrode)
MSE Supplies offers high quality Boron Doped Diamond Electrode on Niobium (BDD/Nb Electrode). The BDD is grown on Niobium (Nb), which makes it different from more common silicon substrate. It has improved chemical resistance and electrochemical stability than silicon based. It is recognized as being superior to other electrode materials due to excellent electrochemical properties. Main advantages include: (i) outstanding chemical and dimensional stability, (ii) exceptionally low background current, (iii) an extremely wide potential window for water electrolysis, (iv) a broad electromagnetic transparency window of thin films ranging from the UV-Vis region to the far-infrared region, (v) low magnetic susceptibility compared to other electrode materials, and (vi) excellent biocompatibility (sp3 hybridized structure). It is widely used for environmental protection industry, electronic manufacturing, grinding, and many other applications.
Specifications:
| Size (length x width x thickness) | 100 mm x 100 mm x 2 mm |
| Substrate |
Niobium (Nb) with pretreatment |
| Substrate Surface Finish |
Etched |
| BDD Doping Level | ~2500 ppm |
| BDD Resistivity | 15 mΩ.cm |
| BDD Thickness | 6 ± 1 um |
| BDD Coating Side | Double side (WA5405) |
*Other doping levels, shapes, metal plate materials are available upon request.