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Sputtering Targets

MSE PRO™ Custom-Made Sputtering Targets

MSE PRO™ high quality sputtering targets have been used by customers worldwide for physical vapor deposition (PVD) of thin films, laser ablation deposition (PLD), magnetron sputtering for semiconductor, display, LED, photovoltaic devices, lithium ion batteries, and other applications.

  • Sputtering targets with any chemical composition, purity (99.9%, 99.99%, 99.999%, 99.9999%), and sizes can be custom-made to meet customer-provided specifications.
  • MSE Supplies has a price matching policy and guarantees the best prices for all our sputtering target products.
  • To provide a complete solution, oxygen-free copper backing plate and bonding services are available for each MSE PRO™ sputtering target ordered from MSE Supplies.
  • For product quotation, please email: info@msesupplies.com
  • For technical questions: tech@msesupplies.com

 High Purity Metal Sputtering Targets

Aluminum (Al)

Hafnium (Hf)

Ruthenium (Ru)

Antimony (Sb)

Holmium (Ho)

Samarium (Sm)

Zirconium (Zr)

Indium (In)

Scandium (Sc)

Bismuth (Bi)

Iridium (Ir)

Selenium (Se)

Boron (B)

Iron (Fe)

Silicon (Si)

Cadmium (Cd)

Lanthanum (La)

Silver (Ag)

Carbon or Graphite (C)

Lead (Pb)

Tantalum (Ta)

Cerium (Ce)

Lutetium (Lu)

Tellurium (Te)

Chromium (Cr)

Magnesium (Mg)

Terbium (Tb)

Cobalt (Co)

Manganese (Mn)

Thulium (Tm)

Copper (Cu)

Molybdenum (Mo)

Tin (Sn)

Dysprosium (Dy)

Neodymium (Nd)

Titanium (Ti)

Erbium (Er)

Nickel (Ni)

Tungsten (W)

Europium (Eu)

Niobium ( Nb)

Vanadium (V)

Gadolinium (Gd)

Palladium (Pd)

Ytterbium (Yb)

Germanium (Ge)

Platinum (Pt) 

Yttrium (Y)

Gold (Au)

Praseodymium (Pr)

Zinc (Zn)

Rhenium (Re)

 

 

High Purity Alloy Sputtering Targets

Aluminum Copper (Al-Cu)

Nickel Aluminum (Ni-Al)

Aluminum Chromium (Al-Cr)

Nickel-Chromium (Ni-Cr)

Aluminum Magnesium(Al-Mg)

Nickel-Chromium  Silicon (Ni-Cr-Si)

Aluminum Silicon (Al-Si)

Nickel-Iron (Ni-Fe)

Aluminum Silicon Copper (AlSiCu)

Nickel Niobium Titanium (NiNbTi)

Aluminum Silver (Al-Ag)

Nickel-Titanium (Ni-Ti)

Cerium Gadolinium (Ce-Gd)

Nickel-Vanadium (Ni-V)

Cerium Samarium (Ce-Sm)

Samarium  Cobalt  (Sm-Co)

Chromium Silicon (Cr-Si)

Silver Copper (Ag-Cu)

Chromium- Silicon Monoxide (Cr-SiO)

Silver Tin (Ag-Sn)

Cobalt Chromium (Co-Cr)

Tantalum  Aluminum (Ta-Al)

Cobalt Iron (Co-Fe)

Giant Magnetostrictive Material, GMM

Cobalt Nickel  (Co-Ni)

Terbium  Iron Alloy (TbFe)

Cobalt Iron Boron (Co-Fe-B)

Titanium Aluminum (Ti-Al)

Copper Cobalt (Cu-Co) 

Titanium Nickel (Ti-Ni)

Copper Gallium (Cu-Ga)

Titanium Chromium (Ti-Cr)

Copper Indium (CuIn)

Tungsten Iron (WFe)

Copper Nickel (Cu-Ni)

Tungsten Titanium (W-Ti)

Copper  Zirconium (Cu-Zr)

Zirconium Aluminum (Zr-Al)

Hafnium Iron (Hf-Fe)

Zirconium Iron (Zr-Fe) 

Iron  Boron (Fe-B)

Zirconium Nickel (Zr-Ni)

Iron Carbon (Fe-C)

Zirconium Niobium (Zr-Nb)

Iron Manganese (Fe-Mn)

Zirconium Titanium (Zr-Ti)

Iridium Manganese (Ir-Mn)

Zirconium Yttrium (Zr-Y)

Iridium Rhenium (Ir-Re)

Zinc Aluminum (Zn-Al)

Indium Tin (In-Sn)

Zinc Magnesium (Zn-Mg)

Molybdenum Silicon (Mo-Si)

 

 

Oxide Ceramic Sputtering Targets

Aluminum  Oxide (Al2O3)

Magnesium Oxide (MgO)

Antimony  Oxide (Sb2O3)

Molybdenum Oxide (MoO)

Antimony : Tin Dioxide (Sb:SnO2)(ATO)

Molybdenum Oxide (MoO3)

Barium Titanate (BaTiO3)

Neodymium Oxide (Nd2O3)

Bismuth Ferrite (BiFeO3)

Nd(0.67)Ba(0.33)Mn(1)O(3) (NBMO)

Bismuth Oxide (Bi2O3)

Nickel Oxide (NiO)

Cerium oxide (CeO2)

Praseodymium Oxide (Pr6O11)

Cerium fluoride (CeF3)

Samarium Oxide(Sm2O3)

Chromium Oxide (Cr2O3)

Scandium Oxide (Sc2O3)

Copper Oxide (CuO)

Silicon Monoxide(SiO)

Dysprosium Oxide (Dy2O3)

Silicon Dioxide(SiO2)

Erbium Oxide(Er2O3)

Strontium Titanate (SrTiO3)

Europium Oxide (Eu2O3)

Tantalum Pentoxide (Ta2O5)

Gadolinium Oxide (Gd2O3)

Terbium Oxide (Tb4O7)

Hafnium Oxide  (HfO2 )

Thulium Oxide (Tm2O3)

Holmium Oxide (Ho2O3)

Titanium Oxide (Ti2O3)

Indium Tin Oxide (ITO)

Titanium Oxide (Ti3O5)

Indium Zinc Oxide (IZO)

Titanium Monoxide (TiO)

Indium Oxide (In2O3)

Titanium Dioxide (TiO2)

Indium Gallium Zinc Oxide (IGZO)

Tungsten Oxide (WO3)

Iron Oxide (Fe2O3)

Tungsten Oxide (WO2.9)

Iron Oxide (Fe3O4)

Vanadium Pentoxide (V2O5)

Lanthanum Aluminate (LaAl2O3)

Yttrium oxide (Y2O3)

La(0.67)Ba(0.33)Mn(1)O(3) (LBMO)

Ytterbium Oxide (Yb2O3)

La0.67Sr0.33MnO3 (LSMO)

Zinc oxide (ZnO)

Lead  Zirconate (PbZrO3)

Zinc Aluminum Oxide (AZO)

Lead Oxide (PbO)

Ga2O3 doped ZnO (GZO)

Lead Titanate (PbTiO3)

IZO (Indium Zinc Oxide, 90 wt% In2O3 / 10 wt% ZnO)

Lead Zirconate (PbZrO3)

Zirconium oxide (ZrO2)

Lead Zirconate Titanate (Pb[Zr(x)Ti(1-x)]O3) (PZT)

ZrO2 Doped with Titanium (Ti-ZrO2)

Lithium Titanate (Li4Ti5O12)

Silica Doped Zirconia (ZrO2 + SiO2)

Lutetium Oxide (Lu2O3)

ZrO2 -Y2O3 stabilized (YSZ)


Nitride Ceramic Sputtering Targets

Aluminum Nitride (AlN)

Silicon Nitride (Si3N4)

Boron Nitride(BN)

Tantalum Nitride (TaN)

Gadolinium Nitride (GdN)

Titanium Carbo-Nitride (TiCN)

Hafnium Nitride(HfN)

Titanium Nitride(TiN)

Niobium Nitride (NbN)

 Zirconium Nitride (ZrN)

 

Carbide Ceramic Sputtering Targets

Boron Carbide(B4C)

Titanium Carbo-Nitride (TiCN)

Chromium Carbide (Cr3C2)

Tungsten Carbide (W2C)

Hafnium Carbide (HfC)

Tungsten Carbide (WC)

Molybdenum Carbide (Mo2C)

Tungsten Carbide Doped with Nickel (Ni-WC)

Niobium Nitride (NbC)

Tungsten Carbide Doped with Cobalt (Co-WC)

Silicon Carbide (SiC)

Vanadium Carbide (VC)

Tantalum Carbide (TaC)

Zirconium Carbide (ZrC)

Titanium Carbide (TiC)

 

 

Fluoride Ceramic Sputtering Targets

Aluminum Fluoride (AlF3)

Lithium Fluoride (LiF)

Barium Fluoride (BaF2)

Magnesium Fluoride  (MgF2)

Cadmium Fluoride (CdF2)

Neodymium Fluoride(NdF3)

Calcium Fluoride(CaF2)

Potassium Fluoride (KF)

Cerium Fluoride (CeF3)

Praseodymium Fluoride (PrF3)

Cryolite (Na3AlF6)

Sodium Fluoride (NaF)

Dysprosium Fluoride (DyF3)

Strontium Fluoride (SrF3)

Erbium Fluoride (ErF3)

Samarium Fluoride (SmF3)

Hafnium Fluoride (HfF4)

 Thorium Tetrafluoride (ThF4)

Lanthanum  Fluoride(LaF3)

Ytterbium Fluoride (YbF3)

Lead Fluoride (PbF2)

Yttrium Fluoride (YF3)

 

Silicide Ceramic Sputtering Targets

Chromium Silicide (CrSi2)

Tantalum Silicide (Ta5Si3)

Chromium Silicide (Cr2Si)

Tantalum Silicide (TaSi2)

Cobalt Silicide (Co3Si)

Titanium Silicide(Ti5Si3)

Hafnium Silicide (HfSi2)

Titanium Silicide(TiSi2)

Molybdenum Silicide(Mo5Si3)

Tungsten Silicide (WSi2)

Molybdenum Silicide(MoSi2)

Tungsten Sulfide (WS2)

Nickel Silicide (NiSi)

vanadium Silicide (V3Si)

Niobium Silicide (Nb5Si3)

Vanadium Silicide (VSi2)

Niobium Silicide(NbSi2)

Zirconium Silicide (ZrSi2)


Sulfide Ceramic Sputtering Targets

Arsenic Sulfide (As2S3)

Manganese Sulfide(MnS2)

Antimony Sulfide (Sb2S3)

Molybdenum Sulfide (MoS2)

Cadmium  Sulfide (CdS )

Niobium Sulfide (NbS1.75)

Indium Sulfide (In2S3)

Tantalum Sulfide (TaS2)

Iron Sulfide(FeS)

Tungsten Sulfide (WS2)

Lead Sulfide (PbS)

Zinc Sulfide (ZnS)


Boride Ceramic Sputtering Targets

Chromium Boride (Cr2B)

Neodymium Diboride (NdB2)

Chromium Diboride (CrB2)

Tantalum Boride (TaB)

Chromium Boride (CrB)

Tantalum Diboride (TaB2)

Chromium Boride (Cr5B3)

Titanium Diboride (TiB2)

Hafnium Boride (HfB2)

Tungsten Boride (WB)

Iron Boride (FeB)

Tungsten Diboride (WB2)

Lanthanum Hexaboride (LaB6)

Vanadium Boride (VB)

Molybdenum Boride (Mo2B)

Vanadium Diboride (VB2)

Molybdenum Boride (Mo2B5)

Zirconium Diboride (ZrB2)

Neodymium Boride (NdB)

 

 

Selenide Ceramic Sputtering Targets

Bismuth Selenide  (Bi2Se3)

Molybdenum Selenide (MoSe2)

Cadmium Selenide (CdSe)

Niobium Selenide (NbSe2)

Gallium Selenide (Ga2Se3)

Tantalum Selenide (TaSe2)

Indium Selenide (In2Se3)

Tungsten Selenide (WSe2)

Lead Selenide (PbSe)

Zinc Selenide (ZnSe)

 

Telluride Sputtering Targets

Aluminum Telluride (Al2Te3)

Niobium Telluride (NbTe2)

Cadmium Telluride (CdTe)

Tantalum Telluride ( TaTe2)

Lead Telluride (PbTe)

Tungsten Telluride (WTe2)

Molybdenum Telluride (MoTe2)

Zinc Telluride (ZnTe)

 

Antimonide Sputtering Targets

Indium Antimonide (InSb)

Nickel Antimonide (NiSb)

Gallium Antimonide (GaSb)

 

 

Arsenide Sputtering Targets

Indium Arsenide (InAs) undoped, Zn-doped, or Sn-doped

Gallium Arsenide (GaAs)

Tin Arsenide (SnAs)

 

 

Solid State Electrolyte Targets

LGPS Target, Li10GeP2S12

Li7P3S11 Target, 70Li2S·30P2S5