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Titanium Sputtering Target Ti

Titanium Sputtering Target Ti

  • $ 5800


Description for Titanium Sputtering Target

Titanium is a common material found in a myriad of products including watches, drill bits, laptops, and bicycles, just to name a few. In pure form, it is lustrous and silvery-white in appearance. It has a melting point of 1,660°C, a density of 4.5 g/cc, and a vapor pressure of 10-4 Torr at 1,453°C. It is a sturdy material which is easily fabricated when heat is applied. Its strong, lightweight characteristics and excellent corrosion resistance make it ideal for ocean liner hulls, aircraft engines, and designer jewelry. Titanium is biocompatible so it can be found in surgical tools and implants. Titanium is generally evaporated in vacuum for the purposes of wear and decorative, semiconductor, and optical coatings.


Specifications for Titanium Sputtering Target 

Name: Titanium
Symbol: Ti
Atomic Number: 22
Atomic Mass: 47.867 amu
Melting Point: 1660.0 °C (1933.15 °K, 3020.0 °F)
Boiling Point: 3287.0 °C (3560.15 °K, 5948.6 °F)
Number of Protons/Electrons: 22 Number of Neutrons: 26
Classification: Transition Metal
Crystal Structure: Hexagonal
Density @ 293 K: 4.54 g/cm3 Color: silverish

Titanium Sputtering Targets ( Ti target ) 

  • Material: High pure(99.99%,99.995%), ASTM grade 1, ASTM grade 2, TiAl6V4
  • Standard: ASTM B 337/B338, ASTM B385-91,ASTM381, ISO 5832/2,JIS H4650,Din 17851
  • Shape: Discs (Diameter <350mm),  Thickness>1mm Rectangle ( Length ≤1800mm, Width≤400mm Thickness>1mm Tube ( Rotory target, OD: 20mm~160mm, Thickness: 2-20mm, Length: custom-made OD>160, Thickness >8mm, longth <200)     
  • Application: Deposited film nitride as Decorate thin film, Deposited film oxidized to TiO2 as beam splitter or insulator

Titanium Pellet (Evaporation Material)

  • Material: High pure(99.99%,99.995%), ASTM grade 1, ASTM grade 2, TiAl6V4
  • Standard: ASTM B 337/B338, ASTM B385-91,ASTM381, ISO 5832/2,JIS H4650,Din 17851
  • Shape: Pellet, Slug  
  • Dimension: 3X3mm,6X6mm,3X8mm
  • Application: Deposited film nitride as Decorate thin film, Deposited film oxidized to TiO2 as beam splitter or insulator

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