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Tantalum Pentoxide Sputtering Target Ta2O5

  • $ 40590


Tantalum Pentoxide (Ta2O5) Sputtering Target

To add a Cu Backing Plate with Indium Bonding for Sputtering Targets  

Product SKU:

TA3870 – TA3873

CAS#:

1314-61-0

Molar Mass:

441.89 g/mol

Density:

8.18 g/cm3

Melting Point:

1,872 °C

Shape:

Discs, Rectangle, Step, Plates, Sheets, Rods, Custom-Made

Dimension:

Diameter (200mm), Length (300mm), Width (200mm), Thickness (1mm), Custom-Made

MSE Supplies is a premier supplier of quality manufactured sputtering targets; we supply custom chemical compositions, purity and sizes. Our wide variety of targets are grouped by high purity metals, alloys, ceramics, and doped. Our pricing is competitive and we consistently offer price matching for our customers.

Tantalum Pentoxide Evaporation Material (please contact us for a quote)

  • Density: 8.7 g/cm3
  • Purity: 99.99%, Grey / white
  • Melting point: 1872 °C
  • Properties of thin film:
  • Transmission range 400 - 8000 nm
  • Refractive index at 550nm 2.10
Suggestions on evaporation:
    • Electron-beam gun
    • Evaporation temperature 2000 °C
    • Oxygen partial pressure 2-5 x 10-5 Torr
    • Substrate temperature 175 - 300 °C
    • Evaporation Rate 2-5 °/sec
  • Source Container: tantalum or graphite liner
  • Shape: Irregular pieces, pellet, 8-9 mm dia. x 4-5 mm thick sintered tablets,3-12 mm sintered pieces
  • Dimension: 3-8mm irregular pieces
  • Applications: Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48),
  • Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.