Menu
Cart

Tantalum Pentoxide Sputtering Target Ta2O5

  • $ 39700


  • Purity: 99.99%
  • Shapes: Discs (Diameter 350mm, Thickness 1mm), Rectangle Plates  (Length 1100mm, Width 300mm, Thickness 1mm)
  • Applications: Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48)
  • Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.

Tantalum Pentoxide Evaporation Material (please contact us for a quote)

  • Density: 8.7 g/cm3
  • Purity: 99.99%, Grey / white
  • Melting point: 1880 ƒ?Vacuum pressure at 2000ƒ? Pa, at 2200ƒ?0 Pa
  • Properties of thin film:
  1. Transmission range 400 - 8000 nm
  2. Refractive index at 550nm 2.10
  • Hints on evaporation:
  1. Electron-beam gun.
  2. Evaporation temperature 2000 °C
  3. Oxygen partial pressure 2-5 x 10-5 Torr
  4. Substrate temperature 175 - 300 °C
  5. Evaporation Rate 2-5 deg?/sec
  • Source Container: tantalum or graphite liner
  • Shape: Irregular pieces, pellet, 8-9 mm dia. x 4-5 mm thick sintered tablets,3-12 mm sintered pieces
  • Dimension: 3-8mm irregular pieces
  • Applications: Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48),
  • Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.