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Silicon Nitride Sputtering Target Si3N4

Silicon Nitride Sputtering Target Si3N4

  • $ 19800


Specifications Silicon Nitride Sputtering Target

  • Purity --- >99%, >99.9%
  • Shape --- Discs, Plate, Step (Dia 320mm,,  Thickness 2mm) Rectangle, Sheet,  Step (Length ≤400mm, Width ≤200mm, Thickness ≥2mm) 

Silicon Nitride Nanometer Powder Features

  • Purity: 99.0%     
  • Oxygen content:  <0.62wt%  
  • Dissociative Si (%): < 0.3%
  • Color: white      
  • Crystal Phase: Amorphous 
  • Average particle size (D50): <20nm
  • Specific surface area: >115m2/g
  • Loose loading density:  0.05g/cm3  
  • Manufacture method: Plasma arc vapor 

Silicon Nitride Nanometer Powder

  • Purity: 99.1%     
  • Oxygen content: <0.9wt%  
  • Color: shallow brown      
  • Crystal Phase: Hexagonal 
  • Average particle size (D50): <100-800nm
  • Specific surface area: >45m2/g
  • Loose loading density:  0.44g/cm

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