MSE PRO Bismuth Ferrite Sputtering Target BiFeO3
SKU: TA1002
Specifications for Bismuth Ferrite Sputtering Target
To add a Cu Backing Plate with Indium Bonding for Sputtering Targets
Product Name |
BiFeO3 sputtering target |
Formula |
BiFeO3 |
Purity | 99.9% 3N |
Impurity content | <0.01% |
Grain Size | <1000 um |
Technics | Powder metallurgy |
Shape | Sputtering Targets, Disk, Plate, according to your request |
Available size | Round: dia 25~250mm, Customization is available |
Application | Widely used in coating processing industries such as optical data storage application and film coating. |
Advantage | High purity low content of impurities Better heat dissipation High hard texture High tensile strength |