MSE PRO 4 inch Chromium (Cr) Thin Film on Silicon Wafer

$ 269⁶⁹
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MSE PRO™ 4 inch Chromium (Cr) Thin Film on Silicon Wafer

Chromium (Cr) films are commonly used as thin film resistors due to their low temperature coefficient of resistivity. Additionally, chromium serves as an underlayer for attaching other films and for use in longitudinal magnetic recording media.

Specifications:

Size	4 inch
Substrate	Silicon wafer
Substrate Thickness	775 um +/- 25um
Substrate Doping Type	P-type/ Boron-doped
Substrate Orientation	<100>
Substrate Resistivity	1-100 ohm-cm
Deposition Method	PVD
Substrate Surface	Single Side Polished
Thin Film Material	Chromium (Cr)
Thin Film Thickness	50 nm - 300nm customizable

Reference:

[1] Gotoh, Yasuhito, & Taga, Yasunori . Takagi, Toshinori . (Ed.). (1989). Structures and properties of chromium thin films prepared by anisotropic-emission-effect sputter-deposition. Japan: Kyoto Univ, Research Group of Ion Engineering in Ion Beam Engineering Experimental Lab.

[2] Sea-Fue Wang, Hsui-Chi Lin, Hui-Yun Bor, Yi-Lung Tsai, Chao-Nan Wei, Characterization of chromium thin films by sputter deposition, Journal of Alloys and Compounds, Volume 509, Issue 41, 2011, Pages 10110-10114.