MSE PRO 4 inch Aluminum (Al) Thin Film on Silicon Wafer

$ 269⁹⁵
Save $ 29⁰⁵

MSE PRO™ 4 inch Aluminum (Al) Thin Film on Silicon Wafer

This versatile metal, aluminum, is a commonly used material due to its lightweight nature, excellent heat and electricity conduction, and strong reflectivity. Its applications range from telescope lenses and headlamps to nanoparticles and plasmonic devices. Additionally, aluminum thin films are utilized in various industries for purposes such as creating nanoporous structures and providing reflective and patterned surfaces for material analysis.

Specifications:

Size	4 inch
Substrate	Silicon wafer
Substrate Thickness	775 um +/- 25um
Substrate Doping Type	P-type/ Boron-doped
Substrate Orientation	<100>
Substrate Resistivity	1-100 ohm-cm
Deposition Method	PVD
Substrate Surface	Single Side Polished
Thin Film Material	Aluminum (Al)
Thin Film Thickness	50 nm - 1500 nm customizable

Reference:

[1] Parametric study on the anodization of pure aluminum thin film used in fabricating nano-pores template. Int. J. Electrochem. Sci 8, no. 7 (2013): 9741-9751.

[2] Conduction mechanisms at low-and high-resistance states in aluminum/anodic aluminum oxide/aluminum thin film structure. Journal of Applied Physics 112, no. 6 (2012): 063706.

[3] All-aluminum thin film transistor fabrication at room temperature. Materials 10, no. 3 (2017): 222.