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MSE PRO Magnesium Oxide Sputtering Target MgO, Sputtering Targets, MSE Supplies LLC, MSE Supplies
MSE PRO Magnesium Oxide Sputtering Target MgO, Sputtering Targets, MSE Supplies LLC, MSE Supplies
MSE Supplies LLC

MSE PRO Magnesium Oxide Sputtering Target MgO

SKU: TA7200
$ 596.95
$ 669.95 $ 596.95

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Specifications

To add a Cu Backing Plate with Indium Bonding for Sputtering Targets  

  • Melting point: 2852°C
  • Purity: 99.99%
  • Density: 3.58 g/cm3
  • Solubility: soluble in acid
  • Linear expansion coefficient: 10.8 x 10-6/K(300K)
  • Specific heat capacity: 0.209 Cal/g.K(273K)
  • Hardness: (acc. to Mohs) 5.5, (acc. to Knoop) 692 g/mm2
  • Properties of thin film---
  1. Transmission range 200 - 8000nm
  2. Refractive index at 550nm 1.73, at 1014nm 1.72, at 2325nm 1.70, at 5138nm 1.63
  • Hints on evaporation:
  1. Evaporation with electron beam gun.
  2. Evaporation pressure ~10-3Pa
  • Shape---solid substance, White tablets


    Specifications for Magnesium Oxide Sputtering Target

    • Boiling Point 760 mm Hg: 3600 oC
    • Melting Point: 2852 oC
    • Specific Gravity: 3.60
    • Appearance and Odor: White to gray powder, odorless
    • Solubility in H2O: Slightly (<0.1%)

    Magnesium Oxide Sputtering Target Features

    • Purity--- 99.99%
    • Shape---Discs, Plate,Step (Dia 300mm, Thickness 1mm) Rectangle, Sheet, Step (Length 300mm, Width 300mm, Thickness 1mm)

    Magnesium Oxide Wafer

    • Shape--- disk, sheet, tube, step, taper
    • Purity--- 99.99%
    • Diameter--- 30-300mm
    • Length--- 300mm    Width: 300mm
    • Thickness--- 0.5-100mm