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Carbon Sputtering Target C,  MSE Supplies

Carbon Sputtering Target C

  • $ 5600


Specifications for Carbon Sputtering Target

Name: Carbon
Symbol: C
Atomic Number: 6
Atomic Mass: 12.0107 amu
Melting Point: 3500.0 °C (3773.15 °K, 6332.0 °F)
Boiling Point: 4827.0 °C (5100.15 °K, 8720.6 °F)

Number of Protons/Electrons: 6
Number of Neutrons: 6
Classification: Non-metal
Crystal Structure: Hexagonal
Density @ 293 K: 2.62 g/cm3
Color: May be black

Product List Carbon Sputtering Target

Metals
Name Sign Purity Character

Carbon

C

99.99%

Rod, Sheet, Plate, Crucible, Pellet, Sputtering Target

Pyrolytic Graphite (PG)

PG

99.998%

Rod, Sheet, Plate, Crucible, Pellet, Sputtering Target

Alloys
Name Sign Purity Character

Aluminum Titanium Carbon Alloy

AlTiC Alloy

5% Ti - 0.2% C

Waffles, Rods

Aluminum Titanium Carbon Alloy

AlTiC Alloy

3% Ti - 0.2% C

Waffles, Rods

Aluminum Titanium Carbon Alloy

AlTiC Alloy

3% Ti - 0.15% C

Waffles, Rods

Compounds
Name Sign Purity Character

Boron carbide

B4C

99.5

Sputtering Target, Evaporation material,  Powders(40-300mesh)

Chromium Carbide

Cr3C2

99.5%

Sputtering Target, Evaporation material,  Powders(40-300mesh)

Chromium Carbonitride

CrCN

99.5%

Sputtering Target, Evaporation material,  powders(40-300mesh)

Hafnium carbide

HfC

99.5%

Sputtering Target, Evaporation material,  powders(40-300mesh)

Molybdenum carbide

Mo2C

99.5

Sputtering Target, Evaporation material,  powders(40-300mesh)

Niobium Carbide

NbC

99.5%

Sputtering Target, Evaporation material,  powders(40-300mesh)

Silicon carbide

SiC

99.5

Sputtering Target, Evaporation material,  powders(200-300mesh)

Tantalum Carbide

TaC

99.5%

Sputtering Target, Evaporation material,  powders(200-300mesh)

Titanium Carbide

TiC

99.5%

Sputtering Target, Evaporation material,  powders(40-300mesh)

Titanium Carbonitride

TiCN

99.5%

Sputtering Target, Evaporation material,  powders(40-300mesh)

Tungsten carbide

WC

99.5%

Sputtering Target, Evaporation material,  powders(200-300mesh)

Tungsten carbide

W2C

99.5%

Sputtering Target, Evaporation material,  powders(200-300mesh)

Tungsten carbide -cobalt

WC - 6 wt. % Co

99.5%

Sputtering Target, Evaporation material,  powders(200-300mesh)

Tungsten carbide -cobalt

W2C - 12 wt. % Co

99.5%

Sputtering Target, Evaporation material,  powders(200-300mesh)

Vanadium carbide

VC

99.5

Sputtering Target, Evaporation material,  powders(200-300mesh)

Zirconium Carbide

ZrC

99.5%

Sputtering Target, Evaporation material,  powders(100-300mesh)


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