MSE Supplies offers a High Vacuum Magnetron Ion Sputtering Coater with both Direct Current (DC) and Radio Frequency (RF) Model. High Vacuum Magnetron Ion Sputtering Coater provides the most stable sputtering environment and achieves the basic experimental conditions of magnetron sputtering in a very short period of time. It uses high quality and constant power magnetron sputtering power supply to ensure constant coating deposition rate. The use of magnetron cathodes is also effective in reducing plasma exposure to the sample, thermal effects and ion bombardment damage. The DC model is more suitable for the coating of conductive materials while the RF model allows sputtering both conductive or non-conductive substance on specimen without accumulating discharge on the sample surface. Thus it improves physical vapor deposition (PVD) performance. It is widely used for SEM sample preparation, coating and surface treatment of metals, ceramics, semiconductors, insulators or other kinds of membrane material preparation. It is easy to operate and user friendly. Vacuum Pump and Chiller are included.

Brand: MSE PRO™

Manufacturer: MSE Supplies LLC

MSE Supplies is a leading Sputtering Targets supplier and offers custom-made high purity sputtering targets. 

Technical Specifications