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Hafnium Oxide (HfO2) Sputtering Target Features
- Purity: 99.95%
- Shape: Discs, Rectangle, Rods, Pellets, Irregular, Custom-Made
- Dimensions:
- Discs: Dia(360mm), Thickness(0.5mm)
- Rectangle: Length(600mm), Width(350mm), Thickness(0.5mm)
- Rods: Dia(360mm), Length(600mm)
- Pellets: Dia(360mm), Thickness(0.5mm)
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Hafnium Oxide (HfO2) Evaporation Material
- Density--- 9.68-9.90 g/cm3
- Solubility---Insoluble in water
- Purity---99.99%
- Melting point--- 2758 C
- Linear expansion coefficient---5. x 10-6/K
- Properties of thin film
- Transmission range: 220 - 12000nm
- Refractive index at 250nm: 2.15, at 500nm: 2
- Hints on evaporation
- Evaporation with electron-beam gun.
- Oxygen partial pressure 1 x 10-2 Pa
- Evaporation temperature 2600 ~ 2800°C
- Substrate temperature 250°C
- Rate of deposition 2 nm/s
- Evaporate with low energy density
- Shape---Solid substance, White or grey tablets, Powder
- Application ---Anti-reflection coatings, interference coatings for the UV.
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