Home » MSE PRO Hafnium Oxide Sputtering Target HfO2
MSE PRO Hafnium Oxide Sputtering Target HfO<sub>2</sub> AI image
MSE PRO Hafnium Oxide Sputtering Target HfO<sub>2</sub> AI image
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MSE PRO Hafnium Oxide Sputtering Target HfO2

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SKU: TA5902
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To add a Cu Backing Plate with Indium Bonding for Sputtering Targets  

Product Information for Hafnium Oxide Sputtering Target

  • Boiling Point: 5400oC
  • Melting Point: 2758oC +/- 25oC
  • Specific Gravity: 9.68 g/cm3
  • Solubility in H2O: Insoluble
  • Appearance and Odor: off white color solid

Hafnium Oxide (HfO2) Sputtering Target Features

  • Purity: 99.95%
  • Shape: Discs, Rectangle, Rods, Pellets, Irregular, Custom-Made
  • Dimensions:
    • Discs: Dia(360mm), Thickness(0.5mm)
    • Rectangle: Length(600mm), Width(350mm), Thickness(0.5mm)
    • Rods: Dia(360mm), Length(600mm)
    • Pellets: Dia(360mm), Thickness(0.5mm)

    Hafnium Oxide (HfO2) Evaporation Material

    • Density--- 9.68-9.90 g/cm3
    • Solubility---Insoluble in water
    • Purity---99.99%
    • Melting point--- 2758 C
    • Linear expansion coefficient---5. x 10-6/K
    • Properties of thin film
      • Transmission range: 220 - 12000nm
      • Refractive index at 250nm: 2.15, at 500nm: 2
    • Hints on evaporation
        1. Evaporation with electron-beam gun.
        2. Oxygen partial pressure 1 x 10-2 Pa
        3. Evaporation temperature 2600 ~ 2800°C
        4. Substrate temperature 250°C
        5. Rate of deposition 2 nm/s
        6. Evaporate with low energy density
      • Shape---Solid substance, White or grey tablets, Powder
      • Application ---Anti-reflection coatings, interference coatings for the UV.