MSE PRO Aluminum Nitride Sputtering Target AlN

Aluminum Nitride Sputtering Targets Specifications

• Purity: 99.8% or International standards type
• Shape: Discs, Plate,Step (Dia 350mm, Thickness 1mm)
• Rectangle, Sheet, Step (Length 350mm, Width 200mm, Thickness 1mm)
• Custom shapes and sizes available for quoting

Aluminum Nitride Substrate (AlN Ceramic)

• Purity: 99%, 99.99% or International standards type
• Shape: Discs, Rectangle, Step, Plates, Sheets, Rods, Custom-Made
• Dimension: Diameter (200mm), Length (300mm), Width (200mm), Thickness (1mm), Custom-Made
• Custom shapes and sizes available for quoting

Aluminum Nitride Nanometer Powder

• Purity: 99%
• Oxygen content: <0.8wt%,
• Dissociative Si% 0.2
• Color: off white
• Crystallographic phase: Hexagonal
• Average particle size (D50): <50nm
• Specific surface area: >78m²/g
• Apparent density: 0.12g/cm³
• Manufacture method: Plasma arc vapor
• Application: Nano Aluminum nitride primary used in integrate circuit subtract, electronic devices, optical devices, thermal emission devices,crucibles used at high temperatures,preparation of composites of metal matrices and polymer matrices,especially,in the high temperature seal binders and electronic encapsulation materials,Nano-AlN will be substantially applied in future.
• Store: It should be storing the cool and dry rooms without solar light. The product cannot be in big compression. In the use process of Nano-AlN powders, in order to avoid the powder aggregating caused by absorbing moistness and thus affecting application effects,the Nano-AlN powder can be not exposed in air.

Chemical Analysis via ICP-AES

Element

Value (ppm)

Ni

112

Fe

265

Si

80

Ca

44

Mg

20

Cu

60

N

33.7%