Zinc Sulfide (ZnS) Sputtering Target
To add a Cu Backing Plate with Indium Bonding for Sputtering Targets
|
Product SKU:
|
TA0407 – TA0414
|
|
CAS#:
|
1314-98-3
|
|
Molar Mass:
|
97.47 g/mol
|
|
Density:
|
4.09 g/cm3
|
|
Melting Point:
|
1,850 °C
|
|
Shape:
|
Discs, Rectangle, Step, Plates, Sheets, Rods, Custom-Made
|
|
Dimension:
|
Diameter (200mm), Length (300mm), Width (200mm), Thickness (1mm), Custom-Made
|
Zinc Sulphide Evaporation Material (please contact us for quote)
- Density: 3.98 g/cm3
- Purity: 99.9%, 99.9%
- Hardness: (acc. to Mohs) 3.5 -- 4, (acc. to Knoop) 178X27 Kg/mm2, Linear expansion coefficient 6.5X10-6
- Melting point: 1850°C
- Specification: Solubility 1X10-3g/100g H2O, Soluble in acid,
- Properties of thin film
- Transmission range 4000 ~ 14000nm
- Refractive index at 550nm ~ 2.3um
- Suggestions on Evaporation
- Molybdenum, tantalum boat, Mo boat, electron-beam gun, ION Gun
- Evaporation temperature 800 to 100 C
- Evaporation pressures 10-3 to 10-4
- Substrate temperature 30 ~ 150 C
- Color/Shape: solid substance, White or yellowish powder,tablets, granular.
- Shape: (Granular)3-6mm, 6-50mm, 10-70mm (Tablet) Dia 8mm or other
- Applications: Anti-reflection films. PVD or CVD process as evaporation materials in Decorative and IR coating, often with low refractive materials MgF2, SiO2, SiO or high refractive materials Ge. Multi-layer coatings, beam splitters.
|
|