Moorfield MiniLab 060 (Modular PVD System)
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Moorfield MiniLab 060 (Modular PVD System)
Description
MiniLab systems from Moorfield provide superior coating performance, with the flexibility and modularity of design to address a huge range of customer requirements.
The MiniLab range consists of several platforms. Each platform is generally associated with a specific process chamber size. While all chambers are built to the same standards and allow for high-vacuum operation, larger chambers allow for more techniques and flexibility than their smaller counterparts. In addition to thin-film deposition, MiniLab systems can also be fitted with complementary techniques such as ion beam sources, etching components and annealing stages (platform-dependent)
MiniLab 060 systems are floor-standing vacuum evaporators for metal, dielectric and/or organics thin-film deposition. All systems contain a box-type stainless-steel process chamber with front door for loading/unloading. A turbomolecular pumping system is standard, for high vacuum base pressures of better than 5×10-7 mbar. Exact configuration is extremely flexible and dependent on customer budgets and applications.
Control system
The unit is fitted with high-stability, industrial-grade PLC electronics. User operation is via a 7” touchscreen HMI or integrated PC. Powerful but easy-to-use software allows for system setup and operation via a menu-driven interface (note that manual control via electronics rack front panels is also possible, depending on exact system configuration). Data-logging and advanced diagnostics are standard features.
Above: Screenshots from touchscreen HMI software for MiniLab 060 system control
Key features
- Modular design
- Front-loading box-type process chamber
- Metals, dielectrics and organics deposition
- Up to 11” diameter substrates
- Turbomolecular/cryogenic pumping systems
- Base pressures < 5 × 10-7 mbar
- Thermal evaporation
- Low-temperature evaporation (LTE)
- Electron-beam evaporation
- Magnetron sputtering
- Touchscreen HMI/integrated PC for control
- Easy servicing
- Comprehensive safety features
- Cleanroom compatible
- Load-locks available
- Proven performance
Technical specifications
|
Chamber |
400 mm × 400 mm × 400 mm stainless |
|
Pressure measurement |
Wide-range gauge (Edwards or Inficon) and |
|
System control |
Industrial-grade, high-stability PLC |
|
Safety interlocks |
Water and vacuum levels. |
|
Substrate stages |
Stainless steel, aluminum or copper with |
|
Deposition monitoring and control |
Various components including the Inficon |
|
Pumping group |
Water-cooled Edwards or Leybold |
|
Deposition sources |
Various types depending on requirements |
|
Weight |
Approximately 100–200 kg; dependent on |
|
Power supplies |
Various types depending on integrated |
|
Size |
1700 mm (height) × 590 mm (depth) |
Configuration and options
The MiniLab 060 base configuration includes a turbomolecular pump positioned on an ISO160 port at the rear of the process chamber. The chamber sits on a double-rack frame that contains all system control electronics and power supplies. MiniLab 060 systems are available with load-locks.
Systems can be equipped with a wide variety of deposition techniques. These include thermal and low-temperature evaporation sources (for metals and organics), magnetron sputtering sources (for metals and inorganics) and electron-beam sources (for most material classes except organics). Deposition sources are typically mounted on the chamber baseplate, but sputter-down configurations are also available.
Substrate stages, usually at the top of the chamber, can accommodate substrate sizes up to 11” diameter. Substrate heating, rotation, bias and Z-shift are available, together with source and substrate shutters. Examples of configurations for specific applications are listed below.
Moorfield TE1 source for standard thermal evaporation
Thermal evaporation
Up to 4 thermal evaporation sources. Moorfield TE1, TE2, TE3 or TE4 configurations available. Water-cooled power feedthroughs and boxed shielding for excellent vacuum maintenance and low contamination. Power supplies available for automatic, manual, sequential- and co-deposition.
Moorfield LTE-1CC source for low-temperature evaporation
Low-temperature evaporation
Up to 4 organics sources. Moorfield LTE-1CC, LTE-2CC and LTE-5CC models available. Alumina or quartz crucibles. Power supplies equipped for temperature and power control, in automatic and manual modes.
Moorfield Flexi-Head MAGNETRON source for magnetron sputtering
Magnetron sputtering
Up to four Moorfield MAGNETRON sources for 2”, 3” or 4” industry-standard targets (easy fitting/removal). RF, DC or pulsed DC power supplies, fully integrated with system controller. Various gas and pressure control packages, including MFCs for process gas introduction. Throttle valve for protecting pumping system from gas loads.
Telemark multi-pocket water-cooled electron-beam source
Electron-beam evaporation
Telemark multi-pocket (e.g., 6 × 7 CC or 8 × 4 CC) electron-beam evaporation sources. Sources are water-cooled and can be connected to automated pocket indexer modules. Ferrotec 3 kW, 5 kW and 10 kW power supplies available.
Multi-technique systems
Various combinations of all of the above can be included in MiniLab 060 systems. For all techniques, deposition rate monitoring (via quartz crystal sensor heads) together with thin-film monitors and controllers are available.
MiniLab 060 with load-lock attachment
Process chamber front door opened to reveal two magnetrons for 3” diameter targets, and high-temperature substrate stage
MiniLab 060 tool with sputter-down configuration
Load-lock chamber customized with a substrate gas-cooling station
System requirements
- Process gases: 25 psi supplies, 99.99% purity or better
- Service gas: Dry compressed air, nitrogen or argon, 60–80 psi supply
- Vent gas: N2, 5 psi
- Power: Single-phase 230 V, 50 Hz, 13 A
- Chilled water: 18–20 °C, 3 L/min, pressure < 4 bar
- Exhaust extraction
Applications
- Fundamental research
- Education
- Product R&D
- Pilot-scale production
For accessories and consumables, please contact us so we can help you choose appropriate products for your needs.
About Moorfield: Moorfield was incorporated in 1995. Moorfield are a team of scientists and engineers specializing in the design, manufacture, supply, and support of vacuum deposition (PVD and CVD), etching and annealing systems. The systems manufactured by Moorfield are applied for research, product development and batch production. Applications include semiconductors, photovoltaics, superconductors, sensors, optics, graphene and 2D materials. Academic and industrial markets are served worldwide, both direct and through a network of authorized, trained representatives.
MSE Supplies is an authorized distributor for Moorfield Nanotechnology in the USA.