MSE PRO Dia. 4'' JGS2 Fused Silica Wafer, 700 μm Thick, DSP, w/ Bevel, Primary Flat Only

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SKU: WA0072051
Regular price $ 29.95

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MSE PRO Dia. 4'' JGS2 Fused Silica Wafer, 700 μm Thick, DSP, w/ Bevel, Primary Flat Only

Introduction

Fused silica (SiO2) wafers are made from high purity fused silica, ground and polished to optical grade on both sides. The fused silica wafers are suitable for many optical applications because of their excellent optical transmission characteristics. Fused silica also has excellent chemical resistance against a wide variety of solvents, as well as exceptional heat resistance, with high dimensional stability over a wide temperature range thanks to its ultra low thermal expansion coefficient.

Specifications

Specification Category Details
Material SiO₂, Fused Silica (Fused Quartz)
Grade JGS2 (Optical Grade Fused Silica)
Wafer Diameter 100 ± 0.2 mm
Wafer Thickness 700 ± 25 µm
Primary Flat 22 ± 2.0 mm (primary flat only)
Surface Polishing Double Side Polished (DSP)
Surface Roughness Ra < 1 nm on both top and bottom surfaces
Surface Finish S/D 40/20
Total Thickness Variation (TTV) < 10 µm
Edge Type Beveled edge
Edge Processing C-shape CNC edge grinding

Physical Properties of Fused Silica

  • Density: 2.2 g/cm3
  • Coefficient of Thermal Expansion: 5.8*10^-7 /k (298 ~ 573 deg K)
  • Thermochromism: Under constant temperature of 1140 degrees, keep annealing for 30 minutes without discoloration.

The JGS2 fused silica is equivalent to Homosil 1, 2 & 3 (Heraeus), Dynasil 1000 & 4000 and 5000 & 6000 (Dynasil)

  • 8 '' inch JGS2 Fused Silica wafers are also available. Custom made JGS fused silica wafers and substrates are available upon request. Please contact us for a quote.
  • Corning Fused Silica 7980 High Purity Fused Silica (HPFS) and JGS1 Fused Silica wafers, windows and substrates are also available and can be custom made. Please contact us for a quote.