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Titanium Dioxide Sputtering Target TiO2

Titanium Dioxide Sputtering Target TiO2

  • $ 20800


Titanium Dioxide (TiO2) Sputtering Targets Features

  • Purity: 99.9%,99.95%,99.99%
  • Refractive index: 2.5-2.9
  • Shape:  Discs, Plate, Step (Dia ≤300mm,,  Thickness 1mm) Rectangle, Sheet,  Step (Length ≤500mm, Width ≤300mm, Thickness 1mm)
  • Application: For RF sputtering machine,used for High index film, multi-layer interference filters.
  • Relation target:  SiO2 sputtering target.

Titanium Oxide Sputtering Targets

  • Purity: 99.9%,99.95%,99.99%
  • Shape:  Discs, Plate, Step (Dia 200mm,,  Thickness 1mm) Rectangle, Sheet,  Step (Length 300mm, Width 200mm, Thickness 1mm) Tube( Diameter< 300mm,  Thickness >2mm )
  • Application: For DC sputtering machine,used for high index film, multi-layer interference filters.
  • Relation target: SiO2 sputtering target...

Titanium Dioxide (TiO2) Evaporation Material  

 

  • Density:  rutile 4.26 g/cm3, brookite 4.17 g/cm3, anatase 3.84 g/cm3
  • Melting point: 1820℃±20℃,Vapour pressure at 1780℃ 1 Pa,at 1930℃ 10 Pa 
  • Solubility:  insoluble in water, sparingly soluble in sulphuric acid, sparingly soluble in alkalis
  • Linear expansion coefficient: 9.19×10-6/K
  • Specific heat capacity:  0.711 KJ/KgK
  • Hardness: (acc. to Mohs) rutile 6 -- 6.5, anatase 5.5 -- 6(acc. to Knoop) rutile 879 Kg/mm2
  • Properties of thin film: 
  1.      Transmission range 400 ~ 12000nm
  2.      Refractive index at 470nm ~2.4, at 550nm ~ 2.3, at 630nm ~ 2.2
  3.      Structure Substrate temperature below 200℃: amorphous
  4.      Substrate temperature above 300℃: rutile     Extremely hard and resistant when deposited onto hot substrates.
  • Hints on evaporation: 
  1.      Evaporation with electron-beam gun
  2.      Substrate temperature 250~ 300 ℃
  3.      Evaporation pressures 5×10-3 to 2×10-2Pa
  4.      Rate of condensation about 10 ~ 20 nm/min
  • Purity:  99.9%  
  • Shape: solid substance, Black or white tablets ,3-8mm irregular pieces, flakes.
  • Area: Highly refractive layers, Multi-layer for laser, mirrors, beam -splitters, heat reflecting mirrors, etc, 

Titanium Dioxide (TiO2) Powder

  • Purity--- 99.9%,99.99%

Titanium Dioxide Nanometer Powder(TiO2) 

  • Purity--- 99.5%(anatase), 99%(Rutile)
  • Granularity --- D50:5nm (anatase), 30nm(Rutile)
  • Specific Surface Area (M2/g) --- 120(anatase), 30(Rutile) 

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