Moorfield MiniLab 026 (Compact Floor Standing Vacuum Evaporator)
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Moorfield MiniLab 026 (Compact Floor Standing Vacuum Evaporator)
Description
MiniLab systems from Moorfield provide superior coating performance, with the flexibility and modularity of design to address a huge range of customer requirements.
The MiniLab range consists of several platforms. Each platform is generally associated with a specific process chamber size. While all chambers are built to the same standards and allow for high-vacuum operation, larger chambers allow for more techniques and flexibility than their smaller counterparts. In addition to thin-film deposition, MiniLab systems can also be fitted with complementary techniques such as ion beam sources, etching components and annealing stages (platform-dependent).
MiniLab 026 systems are ultra-compact floor-standing vacuum systems for metal, dielectric and/or organics thin-film deposition. The MiniLab 026 is also glovebox-compatible and is the only system in the MiniLab range that can be easily retrofitted to an existing glovebox setup. A turbomolecular pumping system is standard, for high-vacuum base pressures of better than 5×10-7 mbar.
Control system
The unit is fitted with high-stability, industrial-grade PLC electronics. User operation is via a 7” touchscreen HMI mounted on the front panel. Powerful but easy-to-use software allows for system setup and operation via a menu-driven interface. Users are able to edit, save and load multiple recipes rapidly (subject to configuration). Data-logging and advanced diagnostics are standard features.
Screenshots from touchscreen HMI software for MiniLab 026 system control
Glovebox compatibility
The MiniLab 026 is compatible with gloveboxes of most manufacturers and can be easily retrofitted to existing setups.
For this, a suitable hole is created in the glovebox floor for accepting the bottom part of the chamber. A hermetic seal is created. The chamber lid is fitted with easy-to-use, ergonomic handles for straightforward operation through glove ports.
A microswitch ensures the chamber is fully closed before pumping routines are initiated. The system’s touchscreen HMI is fitted to the glovebox frame. We can also supply complete glovebox-PVD packages; please contact us for details.
Key features
- Modular design
- Clam-shell’ style chambers
- Turbomolecular pumping systems
- Base pressures < 5×10-7 mbar
- Thermal evaporation
- Low-temperature evaporation (LTE)
- Magnetron sputtering
- Up to 6” diameter substrates
- Touchscreen HMI for system control
- Easy servicing
- Comprehensive safety features
- Cleanroom compatible
- Glovebox compatible
- Proven performance
- Metals, dielectrics and organics deposition
Technical specifications
|
Chamber |
305 mm ID stainless-steel front-loading |
|
Substrate stages |
Stainless steel, aluminum or copper with |
|
Weight |
Approximately 100–200 kg; dependent on |
|
Safety interlocks |
Water and vacuum levels. Door microswitch |
|
Deposition sources |
Various types depending on requirements |
|
Size |
1050 mm (height) × 590 mm (depth) |
|
Pumping group |
Water-cooled Edwards or Leybold |
|
Power supplies |
Various types depending on integrated |
|
Pressure measurement |
Wide-range gauge (Edwards or Inficon) and |
|
System control |
Industrial-grade, high-stability PLC |
Configuration and options
The MiniLab 026 base configuration includes a turbomolecular pump positioned on an ISO100 port at the rear of the process chamber. The base of the chamber sits, as a well, into the supporting frame. The chamber lid sits on top of this (i.e., for a ‘clam-shell’ type chamber arrangement).
The system can be equipped with a wide variety of deposition techniques. These include thermal and low-temperature evaporation sources (for metals and organics), and magnetron sputtering sources (for metals and inorganics). Deposition sources are mounted on the chamber baseplate. Substrate stages are typically fitted at the top of the chamber, and can accommodate a range of substrate sizes up to 6” diameter. Substrate heating, rotation and Z-shift are available. Examples of configurations for specific applications are listed below.
Thermal evaporation
Up to 3 thermal evaporation sources. Moorfield TE1, TE2 or TE3 models available.
Water-cooled power feedthroughs and boxed shielding for excellent vacuum
maintenance and low contamination. Power supplies available for automatic, manual,
sequential- and co-deposition.
Low-temperature evaporation (LTE)
Up to 2 organics sources. Moorfield LTE-1CC, LTE-2CC and LTE-5CC models available.
Alumina or quartz crucibles. Power supplies equipped for temperature and power control, in automatic and manual modes.
Magnetron sputtering
Moorfield MAGNETRON sources for 2” or 3” industry-standard targets (easy fitting/removal). RF, DC or pulsed DC power supplies, fully integrated with system controller. Various gas and pressure control packages, including MFCs for process gas introduction. Throttle valve for protecting pumping system from gas loads.
Multi-technique systems
Various combinations of all of the above can be included in MiniLab 026 systems. For all techniques, deposition rate monitoring (via quartz crystal sensor heads) together with thin-film monitors and controllers are available.
The MiniLab 026 with touchscreen HMI control and a ‘clam-shell’ type chamber, opened here to reveal internal techniques
MiniLab 026 chamber fitted with an LTE source, sputtering magnetron and quartz crystal sensor head for rate/thickness monitoring
MiniLab 026 chamber fitted with two TE1 thermal evaporation soures (covered here with shared source shutter)
MiniLab 026 chamber fitted with TE3 thermal evaporation source, shutter and quartz crystal sensor head
System requirements
- Process gases: 25 psi supplies, 99.99% purity or better
- Service gas: Dry compressed air, nitrogen or argon, 60–80 psi supply
- Vent gas: N2, 5 psi
- Power: Single-phase 230 V, 50 Hz, 13 A
- Chilled water: 18–20 °C, 3 L/min, pressure < 4 bar
- Exhaust extraction
Applications
- Fundamental research
- Education
- Product R&D
For accessories and consumables, please contact us so we can help you choose appropriate products for your needs.
About Moorfield: Moorfield was incorporated in 1995. Moorfield are a team of scientists and engineers specializing in the design, manufacture, supply, and support of vacuum deposition (PVD and CVD), etching and annealing systems. The systems manufactured by Moorfield are applied for research, product development and batch production. Applications include semiconductors, photovoltaics, superconductors, sensors, optics, graphene and 2D materials. Academic and industrial markets are served worldwide, both direct and through a network of authorized, trained representatives.
MSE Supplies is an authorized distributor for Moorfield Nanotechnology in the USA.