{"product_id":"moorfield-nanopvd-s10a-benchtop-rf-dc-magnetron-sputtering-system","title":"Moorfield nanoPVD-S10A (Benchtop RF\/DC Magnetron Sputtering System)","description":"\u003ch2\u003e\u003cspan data-preserver-spaces=\"true\"\u003e\u003cb\u003eMoorfield nanoPVD-S10A (Benchtop RF\/DC Magnetron Sputtering System)\u003c\/b\u003e\u003c\/span\u003e\u003c\/h2\u003e\n\u003ch3\u003e\u003cspan data-preserver-spaces=\"true\"\u003eDescription\u003c\/span\u003e\u003c\/h3\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003enanoPVD systems are compact and suitable for benchtop location — but not to be\u003cbr\u003econfused with microscopy-related products — and are derived from proven R\u0026amp;D thin-film\u003cbr\u003esystem technology. They have been developed through extensive collaboration with\u003cbr\u003eleading academic groups.\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003eThe tools are optimized for ease of use, represent outstanding value for money and are ideal where available space and budgets are key considerations — without compromising on quality of results.\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/files\/Nano.png?v=1771927123\" alt=\"\" width=\"554\" height=\"408\"\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003eModel S10A is a magnetron sputtering system designed for repeatable coating of metals or inorganics (e.g., oxides or nitrides). At the heart of the system is a modular process chamber. The chamber is designed for easy disassembly for routine maintenance. At the rear of the vacuum chamber is a port for the pumping system. The pumping system is based on a turbomolecular pump that is connected to a rotary or scroll-type backing pump.\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003eChamber access is via a hinged top lid. Opening the lid reveals the substrate stage, which can hold substrates up to 4” diameter. The stage can also be fitted with a heater, for platen temperatures up to 500 °C, substrate rotation and a Z-shift assembly.\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003eThe system can be equipped with up to three magnetron sputtering sources, designed for use with industry-standard 2” targets. Target removal\/fitting is straightforward, and bonded targets and magnetic materials are also possible. Sources are positioned for sputter-up operation. For systems with one source, this is mounted from the center of the chamber baseplate such that it shares a central axis with the substrate stage. For systems with 2 or 3 sources, these are located on radial baseplate ports, angled towards the substrate stage in an optimized confocal geometry\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003eSputtering is enabled by either DC or RF power supplies. It is also possible to equip a system with both types, and to provide for codeposition. The addition of Sputter Switch technology enables user selection of supply-source routing (e.g., allowing multiple sources to be run from the same power supply).\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003eThe tool can be configured with up to 3 mass-flow controllers (MFCs). Standard configuration is for Ar only, but O2 and N2 lines are also available for reactive sputtering. During sputtering, a throttle valve restricts conduction between the chamber and pumping\u003cbr\u003esystem, protecting the latter from high gas loads. Pressure control is upstream through MFC flow rates, but can also be carried out automatically via a PID feedback loop in response to defined pressure setpoints and high-resolution measurements.\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003eA quartz crystal sensor head (with PC software) allows for deposition rate monitoring, for rate vs. power calibration purposes.\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cimg\u003e\u003cimg alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/files\/1_b8980f04-c0bf-4f7b-ad09-ee9dce7ab813.png?v=1771927874\"\u003e\u003cimg\u003e\u003cbr\u003eThe nanoPVD-S10A system\u003c\/p\u003e\n\u003cp\u003e\u003cimg alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/files\/24.02.2026_15.40.39_REC.png?v=1771927897\"\u003e\u003cbr\u003e\u003cspan data-preserver-spaces=\"true\"\u003e3 magnetron sputtering sources inside the chamber with quartz crystal sensor head\u003c\/span\u003e\u003c\/p\u003e\n\u003ch3\u003e\u003cspan data-preserver-spaces=\"true\"\u003eControl system\u003c\/span\u003e\u003c\/h3\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003eThe unit is fitted with high-stability, industrial-grade PLC electronics. User operation is via a 7” touchscreen HMI mounted on the front panel. Powerful but easy-to-use software allows for system setup and operation via a menu-driven interface. Users are able to edit, save and load multiple recipes rapidly. Recipes and live data can be logged to a connected PC.\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003e\u003cimg alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/files\/4_cee35bc7-ecb4-4321-a87d-572c62de66c5.png?v=1771928024\"\u003e\u003c\/span\u003e\u003cspan data-preserver-spaces=\"true\"\u003eScreenshots from the touchscreen HMI software through which all user operation of the nanoPVD-S10A is carried out\u003c\/span\u003e\u003c\/p\u003e\n\u003ch3\u003e\u003cspan data-preserver-spaces=\"true\"\u003eOptions\u003c\/span\u003e\u003c\/h3\u003e\n\u003cp\u003e\u003cspan data-preserver-spaces=\"true\"\u003eThe standard configuration for the nanoPVD-S10A includes one magnetron sputtering source, one MFC for Ar, standard pressure control (no feedback loop or capacitance manometer) and a single shutter for substrates up to 2” diameter. Customers must select either the RF or the DC power supply to form the most basic working unit. Beyond this, a variety of options allow the tool to be configured per specific budgets and applications:\u003c\/span\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003e\u003cspan data-preserver-spaces=\"true\"\u003eDry backing pump\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan data-preserver-spaces=\"true\"\u003eFast chamber vent\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan data-preserver-spaces=\"true\"\u003eSubstrate rotation\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan data-preserver-spaces=\"true\"\u003eSubstrate Z-shift\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan data-preserver-spaces=\"true\"\u003eDual shutter for 4” diameter substrates\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan data-preserver-spaces=\"true\"\u003e500 °C platen heating\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan data-preserver-spaces=\"true\"\u003eCo-deposition\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e2 magnetron sputtering sources\u003c\/li\u003e\n\u003cli\u003eDC sputtering power supply\u003c\/li\u003e\n\u003cli\u003eRF sputtering power supply\u003c\/li\u003e\n\u003cli\u003eSputterSwitch technology\u003c\/li\u003e\n\u003cli\u003e1, 2 or 3 MFCs\u003c\/li\u003e\n\u003cli\u003eHigh-resolution automatic pressure control\u003c\/li\u003e\n\u003cli\u003eQuartz crystal sensor head\u003c\/li\u003e\n\u003cli\u003eCapacitance manometer for highresolution pressure control\u003c\/li\u003e\n\u003cli\u003eWide-area coating up to 8” diameter (ask for separate brochure)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/files\/6_a393cc7c-0090-41ef-b727-8fa910003e7f.png?v=1771928336\" alt=\"\"\u003e\u003cbr\u003eView through chamber viewport, showing operating magnetron sputtering source on nanoPVD-S10A\u003c\/p\u003e\n\u003cp\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/files\/7_38d11637-c877-4440-b0b3-dc5bdde081a7.png?v=1771928336\" alt=\"\"\u003e\u003cbr\u003eModel of magnetron sputtering source as fitted to the nanoPVD-S10A\u003c\/p\u003e\n\u003ch3\u003eKey features\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eBenchtop configuration\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eUp to 3 × 2” magnetron sputtering sources\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eUp to 3 MFC-controlled process gases\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eDC and\/or RF power\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eFully automatic operation via touchscreen HMI\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eUp to 4” diameter, or wide-area stages\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eSample heating option\u003c\/li\u003e\n\u003cli\u003eBase pressures \u0026lt; 5 × 10-7 mbar\u003c\/li\u003e\n\u003cli\u003eDefine\/save multiple process recipes\u003c\/li\u003e\n\u003cli\u003eAutomatic pressure control option\u003c\/li\u003e\n\u003cli\u003eEasy servicing\u003c\/li\u003e\n\u003cli\u003eComprehensive safety features\u003c\/li\u003e\n\u003cli\u003eCleanroom compatible\u003c\/li\u003e\n\u003cli\u003eProven performance\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eSystem requirements: (standard configuration)\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eProcess gases: 25 psi supplies, 99.99% purity or better\u003c\/li\u003e\n\u003cli\u003eService gas: Dry compressed air, nitrogen or argon. 60–80 psi supply\u003c\/li\u003e\n\u003cli\u003ePower: Single-phase 230 V, 50 Hz, 10 A\u003c\/li\u003e\n\u003cli\u003eCoolant: 18–20 °C, 1 L\/min, pressure \u0026lt; 2 bar\u003c\/li\u003e\n\u003cli\u003eExhaust extraction\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eApplications\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eFundamental research\u003c\/li\u003e\n\u003cli\u003eEducation\u003c\/li\u003e\n\u003cli\u003eProduct R\u0026amp;D\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cb\u003eFor accessories and consumables, please \u003c\/b\u003e\u003ca href=\"https:\/\/www.msesupplies.com\/pages\/contact-us\" target=\"_blank\"\u003e\u003cem\u003econtact us\u003c\/em\u003e\u003c\/a\u003e\u003cb\u003e so we can help you choose appropriate products for your needs.\u003c\/b\u003e\u003cb\u003e\u003c\/b\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cb\u003e\u003c\/b\u003e\u003cem\u003e\u003cstrong\u003e\u003cb\u003eAbout Moorfield: \u003c\/b\u003e\u003c\/strong\u003e\u003cspan\u003eMoorfield was incorporated in 1995\u003c\/span\u003e\u003cspan\u003e. Moorfield\u003c\/span\u003e\u003c\/em\u003e \u003cspan\u003eare a team of scientists and engineers specializing in the design, manufacture, supply, and support of vacuum deposition (PVD and CVD), etching and annealing systems. The systems manufactured by Moorfield are applied for research, product development and batch production. Applications include semiconductors, photovoltaics, superconductors, sensors, optics, graphene and 2D materials. Academic and industrial markets are served worldwide, both direct and through a network of authorized, trained representatives.\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cem\u003e\u003cstrong\u003eMSE Supplies\u003c\/strong\u003e\u003cspan\u003e \u003c\/span\u003eis an authorized distributor for\u003cspan\u003e \u003c\/span\u003e\u003cstrong\u003eMoorfield Nanotechnology in the USA.\u003c\/strong\u003e\u003c\/em\u003e\u003c\/p\u003e","brand":"Moorfield Nanotechnology","offers":[{"title":"2 Magnetron Sources","offer_id":41438077976634,"sku":"nanoPVD-S10A-2FC-MSE","price":0.0,"currency_code":"USD","in_stock":true},{"title":"3 Magnetron Sources","offer_id":41438078009402,"sku":"nanoPVD-S10A-3FC-MSE","price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/files\/DSC06318-Edit_1.jpg?v=1771930183","url":"https:\/\/www.msesupplies.com\/products\/moorfield-nanopvd-s10a-benchtop-rf-dc-magnetron-sputtering-system","provider":"MSE Supplies","version":"1.0","type":"link"}