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Mini Infrared Laboratory Thin Film Annealing Furnace with Heating up to 1150 °C - Precision Temperature Control and Rapid Heating and Cooling - MSE Supplies

Mini Infrared Laboratory Thin Film Annealing Furnace with Heating up to 1150 °C - Precision Temperature Control and Rapid Heating and Cooling

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This Mini infrared laboratory thin film annealing furnace is designed for laboratory thin film samples under clean environment. This furnace is ideal for precise temperature control (± 0.1 °C) and rapid heating for a number of applications, such as: 
  • Annealing for the crystallization of deposited thin films
  • Post ion implantation diffusion annealing 
  • Rapid-heating annealing
  • Rapid-heating oxidation
  • Rapid-heating nitridation
  • Rapid heating and cooling for thermal shock testing
Technical Parameters:
Maximum Sample Size: 20mm x 20mm x 2mm (L x W x H)
Heating Method: Infrared lamps

Maximum Temperature: 1150 °C

Temperature control: 
 Omron PID control, self-tuning, and multiple heating and cooling segments

Max. Heating Rate: 
45 °C/min (under vacuum) or 40 °C/min (under Nitrogen gas)

Static temperature accuracy: 
± 0.1 °C

Temperature control components: compatible with K type thermocouple
Rated power: 4 x 1 KW 

 

Clean heat treatment environment: infrared heating, no resistance type heating elements, no thermal insulation materials, ideal for samples that require heat treatment in a clean environment

Water cooling:  4 L/min, 0.3 MPa water pressure
Atmosphere: air, vacuum, nitrogen, or inert gas
Vacuum Pump: mechanical pump