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Mini Infrared Thin Film Annealing Benchtop Furnace up to 1150 °C, Precision Rapid Heating and Cooling Control,  MSE Supplies

Mini Infrared Thin Film Annealing Benchtop Furnace up to 1150 °C, Precision Rapid Heating and Cooling Control

  • $ 15,95000


This infrared mini laboratory thin film annealing furnace is designed for laboratory thin film samples under clean environment. This furnace is ideal for precise temperature control (± 0.1 °C) and rapid heating for a number of applications, such as: 
  • Annealing for the crystallization of deposited thin films
  • Post ion implantation diffusion annealing 
  • Rapid-heating annealing
  • Rapid-heating oxidation
  • Rapid-heating nitridation
  • Rapid heating and cooling for thermal shock testing
Technical Specifications:
Maximum Sample Size: 20mm x 20mm x 2mm (L x W x H)
Heating Method: Infrared lamps

Maximum Temperature: 1150 °C

Temperature control: 
 Omron PID control, self-tuning, and multiple heating and cooling segments
Temperature vs. time setting, maximum steps: 256, maximum programs: 32 programs. Cyclic, hold and other function, PID + fuzzy control, Auto/Manual available, USB communication

Max. Heating Rate: 
45 °C/min (under vacuum) or 40 °C/min (under Nitrogen gas)

Static temperature accuracy: 
± 0.1 °C

Temperature control components: compatible with K type thermocouple
Rated power: 4 x 1 KW  

Clean heat treatment environment: infrared heating, no resistance type heating elements, no thermal insulation materials, ideal for samples that require heat treatment in a clean environment

Water cooling:  4 L/min, 0.3 MPa water pressure
Atmosphere: air, vacuum, nitrogen, or inert gas
Vacuum Pump: mechanical pump (not included)
Delivery time: ~2 months ARO

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