Tantalum Pentoxide Sputtering Target Ta<sub>2</sub>O<sub>5</sub>, MSE Supplies

Tantalum Pentoxide Sputtering Target Ta₂O₅

£334⁰⁰

Quantity

Tantalum Pentoxide (Ta₂O₅) Sputtering Target

To add a Cu Backing Plate with Indium Bonding for Sputtering Targets

Product SKU:	TA3870 – TA3877
CAS#:	1314-61-0
Molar Mass:	441.89 g/mol
Density:	8.18 g/cm³
Melting Point:	1,872 °C
Shape:	Discs, Rectangle, Step, Plates, Sheets, Rods, Custom-Made
Dimension:	Diameter (200mm), Length (300mm), Width (200mm), Thickness (1mm), Custom-Made

MSE Supplies is a premier supplier of quality manufactured sputtering targets; we supply custom chemical compositions, purity and sizes. Our wide variety of targets are grouped by high purity metals, alloys, ceramics, and doped. Our pricing is competitive and we consistently offer price matching for our customers.

Tantalum Pentoxide Evaporation Material (please contact us for a quote)

Density: 8.7 g/cm³
Purity: 99.99%, Grey / white
Melting point: 1872 °C
Properties of thin film:
Transmission range 400 - 8000 nm
Refractive index at 550nm 2.10

Suggestions on evaporation:

Electron-beam gun
Evaporation temperature 2000 °C
Oxygen partial pressure 2-5 x 10-5 Torr
Substrate temperature 175 - 300 °C
Evaporation Rate 2-5 °/sec

Source Container: tantalum or graphite liner
Shape: Irregular pieces, pellet, 8-9 mm dia. x 4-5 mm thick sintered tablets,3-12 mm sintered pieces
Dimension: 3-8mm irregular pieces
Applications: Anti-reflection coatings, interference filters, UV laser applications with silicon dioxide (n = 1.48),
Hard, scratch-resistant and adherent coatings, dielectrics in film capacitors, as gate insulators in large scale integrated circuits requiring low leakage voltage characteristics.