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Aluminum Oxide Sputtering Target Al<sub>2</sub>O<sub>3</sub>,  MSE Supplies

Aluminum Oxide Sputtering Target Al2O3

  • £29100


Specifications Aluminum Oxide Sputtering Target Features

To add a Cu Backing Plate with Indium Bonding for Sputtering Targets  

Material Type Aluminum Oxide (alpha alumina, sapphire)
Symbol Al2O3
Purity 99.99% (4N) or 99.999% (5N)
Color/Appearance White, Crystalline Solid
Melting Point (°C) 2,072
Coefficient of Thermal Expansion 8.1x 10-6/K
Theoretical Density (g/cc) 3.97
Z Ratio 0.336
Sputter RF-R
Max Power Density
(Watts/Square Inch)
20
Type of Bond Indium
Comments Sapphire (alumina) excellent in E-beam; forms smooth, hard films. Thermal evaporation likely not possible.

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