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AR-P 5350 Sensitive Resists for the Production of Vapour Deposition Patterns by Lift-off, 100mL/bottle - MSE Supplies LLC

AR-P 5350 Sensitive Resists for the Production of Vapour Deposition Patterns by Lift-off, 100mL/bottle

  • $ 99995


AR-P 5350 Sensitive Resists for the Production of Vapour Deposition Patterns by Lift-off, 100mL/bottle

Photoresists are in particular used in microelectronics and microsystems technologies for the fabrication of µm- and sub-µm structures. AR-P 5350 is a sensitive resists for the production of vapour deposition patterns by lift-off. 

Features:

  • Broadband UV, i-line, g-line
  • High photosensitivity, high resolution
  • Good adhesion properties
  • For undercut structures for the production of evaporation samples, in particular of metal using lift-off techniques e.g. for conductor paths
  • Plasma etching resistant, temperature stable up to 120 °C
  • Combination of novolac and naphthoquinone diazide
  • Safer Solvent PGMEA

Specifications:

SKU# CM8110
Type AR-P 5350
Film thickness/4000rpm 1.0um
Resolution 0.5um
Contrast 5.0
Flash point 424℃
Package size 100mL/bottle

Note: Store at 10-18℃. Available package size: 100mL, 250mL, 1L.