Aluminum Oxide Sputtering Target Al2O3
Specifications Aluminum Oxide Sputtering Target Features
To add a Cu Backing Plate with Indium Bonding for Sputtering Targets 
| Material Type | Aluminum Oxide (alpha alumina, sapphire) |
| Symbol | Al2O3 |
| Purity | 99.99% (4N) or 99.999% (5N) |
| Color/Appearance | White, Crystalline Solid |
| Melting Point (°C) | 2,072 |
| Coefficient of Thermal Expansion | 8.1x 10-6/K |
| Theoretical Density (g/cc) | 3.97 |
| Z Ratio | 0.336 |
| Sputter | RF-R |
| Max Power Density (Watts/Square Inch) |
20 |
| Type of Bond | Indium |
| Comments | Sapphire (alumina) excellent in E-beam; forms smooth, hard films. Thermal evaporation likely not possible. |
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