
High Vacuum Magnetron Ion Sputtering Coater for SEM Sample Preparation
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MSE Supplies offers a high vacuum magnetron ion sputtering coater that is suitable for spraying gold, platinum, etc., coating on FE-SEM specimens. It uses high quality and constant power magnetron sputtering power supply to ensure constant coating deposition rate. The use of magnetron cathodes is also effective in reducing plasma exposure to the sample, thermal effects and ion bombardment damage. It is widely used to coat non-conductive SEM samples for better imaging. It is also excellent for surface treatment and coating when using other sputtering targets. High vacuum, less than 3Pa can be achieved quickly when using proper vacuum pumps. It is user friendly and easy to operate using touch panel control.
Brand: MSE PRO™
Manufacturer: MSE Supplies LLC
MSE Supplies is a leading Sputtering Targets supplier and offers custom-made high purity sputtering targets.
Technical Specifications
SKU# | MA0599 |
Vacuum Pump Set | Oil free diaphragm pump + molecular pump set |
Pumping Speed | >0.7m3/h pump + 60 L/S molecular pump |
Vacuum Limit | <10-3Pa |
Working Pressure | 0.5-2Pa |
Vacuuming Time | <5Min |
Vacuum Measure | Measuring range from atmosphere to 10-3Pa |
Gas Control | MFC gas mass flow controller (50SCCM Ar) |
Chamber Size | 150*110mm scratch resistant quartz glass |
Magnetron Target Source | Target size 50*0.1-3mm (recommended thickness>0.2mm)/ with manual stop Target source: precious metal source such as Au/Pt or conventional metal such as Cr, W, Ag (with Ar gas) |
Sputtering Time | Programmable |
Operation Method | Touch screen control |
Weight/Size | 30kg/480mm wide* 434mm high |
Power Supply | 110-220V AC, 50-60Hz |
Power Consumption | <500W |
Cooling Method | Air cooling |
Warranty | One year limited warranty with lifetime product support |
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