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Aluminum-Scandium Alloy Sputtering Target Al/Sc, 99.95% Purity

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Product Name: Al-Sc Alloy Sputtering Target

Production Process:

  • Vacuum Induction Melting VIM
  • Machining with CNC to the dimensions
  • Indium bonding to oxygen-free copper backing plate

Composition: Each target is custom made. Please contact us to discuss your requirements.

An example of product data*

Download the Detailed Product Technical Datasheet for Al-Sc Alloy Sputtering Target

 

Actual Results

Composition

Al 44.67at%, Sc 55.33at%

Product Purity

3N5 (99.95%)

Dimensions (mm)

D230 × 8mm

*Other compositions and sizes are available for custom fabrication upon customer’s request.

Alloy Elemental Purity: Al-Sc >99.95% 

Impurity Content (ppm)

Element

Content

Element

Content

Element

Content

Element

Content

La

2.50

Dy

4.20 

Si

7

Ni

22

Ce

0.25

Ho

3.20

Ca

82

Cu

114

Pr

0.04

Er

1.10

Ti

24

Zn

7.2

Nd

0.18

Tm

0.23

V

8

W

1.8

Sm

0.33

Yb

0.16

Cr

57

O

387

Eu

0.12

Lu

0.06

Mn

12

 

 

Gd

1.20

Y

2.40

Fe

24 

 

 

Tb

7.30

Mg

8.20

Co

10

 

Product List for Scandium Sputtering Target and Related Products

Metals
Name Purity Form

Scandium Metal

Sc

99.9%,99.99%

Lump, Sputtering Targets, Evaporation Material, Disk, Plate, Sheet, Tube

Scandium Alloys
Name Symbol Purity Form

Aluminum Scandium Alloy Sputtering Target

AlSc Alloy

Al-Sc 99.95%

Disc, Plate