Bismuth Ferrite Sputtering Target BiFeO3
Specifications for Bismuth Ferrite Sputtering Target
To add a Cu Backing Plate with Indium Bonding for Sputtering Targets 
| Product Name |
BiFeO3 sputtering target |
| Formula |
BiFeO3 |
| Purity | 99.99% 4N |
| Impurity content | <0.01% |
| Grain Size | <1000 um |
| Technics | Powder metallurgy |
| Shape | Sputtering Targets, Disk, Plate, according to your request |
| Available size | Round: dia 25~250mm, Customization is available |
| Application | Widely used in coating processing industries such as optical data storage application and film coating. |
| Advantage | High purity low content of impurities Better heat dissipation High hard texture High tensile strength |
| Purity | 99.9% |
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