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Bismuth Ferrite Sputtering Target BiFeO3,  MSE Supplies LLC

Bismuth Ferrite Sputtering Target BiFeO3

  • $ 60800


Specifications for Bismuth Ferrite Sputtering Target 

Product Name BiFeO3 sputtering target
Formula BiFeO3
Purity 99.99%(4N)
Impurity content <0.01%
Grain Size <1000μm
Technics Powder metallurgy
Shape Sputtering Targets, Disk, Plate, according to your request
Available size Round: dia 25~250mm, Customization is available
Application Widely used in coating processing industries such as optical data storage application and film coating.
Advantage High purity low content of impurities
Better heat dissipation
High hard texture
High tensile strength
Purity 99.9%

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