{"title":"Atomic Layer Deposition ALD Equipment","description":"\u003cp\u003e\u003cspan data-contrast=\"none\" lang=\"EN-US\" class=\"TextRun SCXW264025845 BCX0\"\u003e\u003cspan class=\"NormalTextRun SCXW264025845 BCX0\"\u003e\u003cstrong\u003eMSE Supplies\u003c\/strong\u003e offers \u003cstrong\u003eAtomic Layer Deposition equipment and ALD systems\u003c\/strong\u003e engineered for precise thin film deposition across semiconductor manufacturing, materials science, and advanced surface engineering workflows. These deposition systems enable atomic-scale control of film thickness, uniform conformal coating on complex nanoscale structures, and repeatable thin film growth critical for semiconductor fabrication, energy materials, and next-generation device development.\u003c\/span\u003e\u003c\/span\u003e\u003c\/p\u003e","products":[{"product_id":"anric-technologies-benchtop-atomic-layer-deposition-ald-system-at200m-1","title":"Anric Technologies Benchtop Atomic Layer Deposition (ALD) System AT200M","description":"\u003cp\u003eSKU#: AN-AT200M\u003c\/p\u003e\n\u003cp\u003eAtomic Layer Deposition (ALD) is a powerful thin-film deposition technique. Comparing to traditional Chemical Vapor Deposition (CVD), ALD allows even higher quality surface layer with nearly pinhole-free and excellent uniformity, and conformal (coating the backside, filling holes even in porous substrates or coating powders).  These advantages are related to its controllable process. The whole process is continuous and self-limiting, which means the material in the chamber is slowly deposited by precursor separately in single atomic layer and the steps are repeated until achieving desired thickness. It is widely used in electronic, biomedical, photovoltaic, catalysis, sensors, batteries, quantum (2D materials) and other applications.\u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eMSE Supplies\u003c\/strong\u003e\u003cspan\u003e \u003c\/span\u003eoffers the Benchtop Atomic Layer Deposition System AT200M from Anric Technologies. \u003c\/p\u003e\n\u003cp\u003eAT200M is the smallest footprint ALD system available on the market and actually fits in a glovebox. . It is specially designed for simple operation and installation with a focus on educational and metrology markets, where small size and cost effectiveness are the largest concerns. When working with samples that dictate glovebox usage, such as sulfides, the compact nature of the AT200M turns this into a trivial matter. AT200M utilizes semiconductor grade components, metal sealed lines, and a robust programmable logic controller (PLC) driven user interface that yields fast cycling and high quality single component thin films while still realizing easy maintenance and safe, repeatable operation. \u003c\/p\u003e\n\u003cp\u003eThe AT200M is also helpful for TEM applications as trenches that can be \u003cbr\u003econformally filled with a thin ALD oxide, typically HfO\u003csub\u003e2\u003c\/sub\u003e, and then cross-sectioned. The high atomic number of Hf provides excellent contrast in TEM. The unobtrusive footprint of the AT200M matches that of evaporators\/sputtering tools commonly used with SEM\/TEM (SEMS can use platinum conductive coatings).\u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eCountry of Origin:\u003c\/strong\u003e\u003cspan\u003e Made in USA\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cspan\u003e\u003cstrong\u003eManufacturer:\u003c\/strong\u003e Anric Technologies\u003c\/span\u003e\u003c\/p\u003e\n\u003ch2\u003e\u003cb\u003eMain Features:\u003c\/b\u003e\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003eSmall Footprint Benchtop Thermal ALD System W: 14” (35.5cm) x D: 15” (38.1cm) x H: 14.5” (36.8cm) \u003c\/li\u003e\n\u003cli\u003eFits in a Glovebox \u003c\/li\u003e\n\u003cli\u003eShort lead time\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eStocked for immediate shipment. \u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003eAccommodates samples up to 5.08cm x 5.08cm x 7.62cm (2in x 2in x 3in) or 2in wafers (customizable chucks) [Powder coating – optional]. . \u003c\/li\u003e\n\u003cli\u003e2 precursor ports with heat traced lines (4 port optional). \u003c\/li\u003e\n\u003cli\u003eVented precursor enclosure. \u003c\/li\u003e\n\u003cli\u003eHigh temperature compatible fast pulsing ALD valves with ultrafast MFC for integrated inert gas purge. \u003c\/li\u003e\n\u003cli\u003eUp to 2 heated precursors up to 1\u003cspan\u003e80\u003c\/span\u003e\u003cspan\u003e°C. \u003c\/span\u003e\n\u003c\/li\u003e\n\u003cli\u003e\u003cspan style=\"font-size: 0.875rem;\"\u003eAll stainless steel chamber with temperature range up to 300°C (optional 450°C chuck).\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\n\u003cspan style=\"font-size: 0.875rem;\"\u003eHigh exposure available with static processing mode. \u003c\/span\u003e\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003e5\" display with integrated PLC control. \u003c\/li\u003e\n\u003cli\u003eLifetime software upgrades included. \u003c\/li\u003e\n\u003cli\u003e1 year warranty (parts and labor included). \u003c\/li\u003e\n\u003cli\u003e3 years process support\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cstrong\u003eOptions:\u003c\/strong\u003e Vacuum pump | Ozone generator (AT-O3-1)[required for SiO2, low temp. Pt, Ir, MoO2, high quality Al2O3 below 60C and high quality HfO2] | Bottle heater | Custom chucks\/holders (4x2 inch wafers also available) | ALD precursors | 4 port option | Remote software control | QCM - temperature compensated QCM up to 300°C | Powder coat option (10 micron powders or larger) | New Hollow Cathode Plasma Source with 1 MFC (another one optional) for counter reactants (ask for the AT 200M Plus)\u003c\/p\u003e\n\u003cp\u003e\u003cstrong style=\"font-size: 0.875rem;\"\u003ePlease \u003cspan style=\"text-decoration-line: underline;\"\u003e\u003ca href=\"https:\/\/www.msesupplies.com\/pages\/contact-us\" target=\"_blank\"\u003e\u003cem\u003econtact us\u003c\/em\u003e\u003c\/a\u003e\u003c\/span\u003e for vacuum pump options.\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\u003c\/ul\u003e\n\u003ch2\u003eTechnical Specifications\u003c\/h2\u003e\n\u003ctable width=\"547\" style=\"font-weight: 400;\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd width=\"186\"\u003e\n\u003cp\u003eMaterial\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd width=\"361\"\u003e\n\u003cp\u003eStandard Recipes\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003eOxides (AxOy)\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cp\u003eAl, Si*, Ti, Zn, Zr, Hf, Ta, Sn, Mg*, Ir*, V, Mo, W\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003eElementals (A)\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cp\u003eRu, Pd*, Pt*, Ni, Co, W\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003eNitrides (AxNy)\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cp\u003eAl, Ti, Zr, Hf, W\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003eSulfides (AxSy)\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cp\u003eW, Al, Ti, Mo, Zn\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e*Requires ozone (ATOzone)\u003c\/p\u003e\n\u003cp\u003eNote: For materials not mentioned in this table, please \u003cspan style=\"text-decoration: underline;\"\u003e\u003ca title=\"contact us\" href=\"https:\/\/www.msesupplies.com\/pages\/contact-us\" target=\"_blank\"\u003econtact us\u003c\/a\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cem\u003e\u003cstrong\u003e\u003cb\u003eAbout Anric Technologies:\u003c\/b\u003e\u003c\/strong\u003e \u003cspan\u003eAnric Technologies was founded in 2014 by researchers from Harvard University to address the gap in the market for benchtop ALD tools designed and optimized for small samples and small budgets.\u003c\/span\u003e\u003c\/em\u003e\u003c\/p\u003e\n\u003cp\u003e\u003cem\u003e\u003cstrong\u003eMSE Supplies\u003c\/strong\u003e\u003cspan\u003e \u003c\/span\u003eis an authorized distributor of\u003cspan\u003e \u003c\/span\u003e\u003cstrong\u003eAnric Technologies \u003c\/strong\u003efor USA and Canada. \u003c\/em\u003e\u003c\/p\u003e","brand":"Anric Technologies","offers":[{"title":"Default Title","offer_id":39677766008890,"sku":"AN-AT200M","price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/products\/AT200M3123by2342.jpg?v=1667226856"},{"product_id":"anric-technologies-benchtop-atomic-layer-deposition-ald-system-at410","title":"Anric Technologies Benchtop Atomic Layer Deposition (ALD) System AT410","description":"\u003cp data-mce-fragment=\"1\"\u003eSKU#: AN-AT410\u003c\/p\u003e\n\u003cp data-mce-fragment=\"1\"\u003eAtomic Layer Deposition (ALD) is a powerful thin-film deposition technique. Compared to traditional Chemical Vapor Deposition (CVD), ALD allows even higher quality surface layer with nearly pinhole-free, excellent uniformity and conformal (coating and backside, filling holes even in porous substrates). These advantages are related to its controllable process. The whole process is continuous and self-limiting, which means the material in the chamber is slowly deposited by a precursor separately in single atomic layer at a time and the steps are repeated until achieving desired thickness. It is widely used in electronic, biomedical, photovoltaic and other applications.\u003c\/p\u003e\n\u003cp data-mce-fragment=\"1\"\u003e\u003cstrong data-mce-fragment=\"1\"\u003eMSE Supplies\u003c\/strong\u003e\u003cspan data-mce-fragment=\"1\"\u003e \u003c\/span\u003eoffers the Benchtop Atomic Layer Deposition System AT410 from Anric Technologies. \u003c\/p\u003e\n\u003cp data-mce-fragment=\"1\"\u003eThe AT410 is the most cost-effective thermal ALD tool on the market with customizable chucks\/platen of chambers (for 3D parts). It is specially designed for simple operation and installation with a focus on research and development labs and metrology markets, where small size and cost effectiveness are the largest concerns.\u003c\/p\u003e\n\u003cp data-mce-fragment=\"1\"\u003eAT410 has fast cycling capability (up to 1.2nm\/min Al\u003csub\u003e2\u003c\/sub\u003eO\u003csub\u003e3\u003c\/sub\u003e) and high exposure, deep penetration processing available. It has smallest footprint on market (2.5 sq ft), bench top installation and cleanroom compatible. \u003c\/p\u003e\n\u003cp data-mce-fragment=\"1\"\u003e\u003cstrong data-mce-fragment=\"1\"\u003eCountry of Origin:\u003c\/strong\u003e\u003cspan data-mce-fragment=\"1\"\u003e Made in USA\u003c\/span\u003e\u003c\/p\u003e\n\u003cp data-mce-fragment=\"1\"\u003e\u003cspan data-mce-fragment=\"1\"\u003e\u003cstrong data-mce-fragment=\"1\"\u003eManufacturer:\u003c\/strong\u003e Anric Technologies\u003c\/span\u003e\u003c\/p\u003e\n\u003ch2 data-mce-fragment=\"1\"\u003e\u003cb data-mce-fragment=\"1\"\u003eMain Features:\u003c\/b\u003e\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003eSmall footprint (~ 15 \u003cspan data-mce-fragment=\"1\"\u003ein\u003c\/span\u003e\u003csup data-mce-fragment=\"1\"\u003e3\u003c\/sup\u003e or 38.1 cm\u003csup\u003e3\u003c\/sup\u003e)\u003c\/li\u003e\n\u003cli\u003eSemiconductor-grade metal sealed lines and high temperature compatible fast pulsing ALD valves.\u003c\/li\u003e\n\u003cli\u003eUltrafast MFC for integrated inert gas purge.\u003c\/li\u003e\n\u003cli\u003e4″ circular chuck customizable for smaller sizes or other shapes (11 mm tall).\u003c\/li\u003e\n\u003cli\u003e3 organometallic precursors and 2 (up to 3) counter reactants.\u003c\/li\u003e\n\u003cli\u003eHeated lines throughout (from precursor to chamber).\u003c\/li\u003e\n\u003cli\u003eAll aluminum (semiconductor grade) chamber ‒ range up to 320°C\u003c\/li\u003e\n\u003cli\u003e7″ touchscreen PLC controller (no PC required)\u003c\/li\u003e\n\u003cli\u003eLifetime process development assistance \u003c\/li\u003e\n\u003cli\u003e1 year warranty (non-consumable parts and labor included). \u003c\/li\u003e\n\u003cli\u003e3 years process support\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cstrong\u003eOptions:\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eCustomized chuck\/platen (square, indents for smaller pieces, powders)\u003c\/li\u003e\n\u003cli\u003eCustomized chamber (thicker substrates)\u003c\/li\u003e\n\u003cli\u003eATOzone – Ozone generator (required for some films: Pt, Ir, SiO\u003csub\u003e2\u003c\/sub\u003e, MoO\u003csub\u003e2\u003c\/sub\u003e, high quality Al\u003csub\u003e2\u003c\/sub\u003eO\u003csub\u003e3\u003c\/sub\u003e\u003cspan\u003e \u003c\/span\u003ebelow 60°C, high quality HfO\u003csub\u003e2\u003c\/sub\u003e)\n\u003cul\u003e\n\u003cli\u003eOptional – Ozone Safety Monitor w real time detection of ambient ozone gas\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/li\u003e\n\u003cli\u003eQCM (Quartz Crystal Microbalance)\u003c\/li\u003e\n\u003cli\u003eGlovebox integration (typically required to not expose substrate to moisture; oxygen, etc..)\u003c\/li\u003e\n\u003cli\u003eExternal control – PC\/software link (allows programing and running, remotely)\u003c\/li\u003e\n\u003cli\u003eVentable Precursor cabinet\u003c\/li\u003e\n\u003cli\u003eSpare Chamber\u003c\/li\u003e\n\u003cli\u003eIGPA (inert gas pressure assist)for low vapor pressure precursors\u003c\/li\u003e\n\u003cli\u003eHigher temperatures on precursors (to 180°C)\u003c\/li\u003e\n\u003cli\u003eThird counter reactant\n\u003cul\u003e\n\u003cli\u003eSoftware control of third counter reactant\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cstrong style=\"font-size: 0.875rem;\"\u003ePlease \u003cspan style=\"text-decoration-line: underline;\"\u003e\u003ca href=\"https:\/\/www.msesupplies.com\/pages\/contact-us\" data-mce-fragment=\"1\" target=\"_blank\"\u003e\u003cem data-mce-fragment=\"1\"\u003econtact us\u003c\/em\u003e\u003c\/a\u003e\u003c\/span\u003e for vacuum pump options.\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\u003c\/ul\u003e\n\u003ch2\u003eSpecifications\u003c\/h2\u003e\n\u003ctable style=\"font-weight: 400;\" width=\"547\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd width=\"186\"\u003eProcess Flow \/ Chamber Geometry\u003c\/td\u003e\n\u003ctd width=\"361\"\u003eCross flow with point source and flow optimized chamber shape\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003eChamber temperatures\u003cbr\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cp\u003eRT to 320°C ± 1 °C\u003cbr\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003e\u003cspan\u003ePrecursor temperatures\u003c\/span\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cp\u003eRT to 150°C ± 2°C (w\/ heating jacket), can upgrade to 180\u003cspan data-mce-fragment=\"1\"\u003e°C \u003c\/span\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eVacuum Pumping (min)\u003c\/td\u003e\n\u003ctd\u003e15 cfm, (pump recommended to be 3-4ft from machine) PFPE oil required (dry pump option)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eTypical Operating Pressure\u003c\/td\u003e\n\u003ctd\u003e200 mtorr\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eDimensions\u003c\/td\u003e\n\u003ctd\u003e23” (586mm) wide, 23” (586mm) deep, 15” (405mm) tall\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eWeight\u003c\/td\u003e\n\u003ctd\u003e~100lb (45kg)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eRequired Power\u003c\/td\u003e\n\u003ctd\u003e110-120 VAC, single phase, 50\/60Hz; 15Amp\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cbr\u003e\u003c\/p\u003e\n\u003cp data-mce-fragment=\"1\"\u003e\u003cem data-mce-fragment=\"1\"\u003e\u003cstrong data-mce-fragment=\"1\"\u003e\u003cb data-mce-fragment=\"1\"\u003eAbout Anric Technologies:\u003c\/b\u003e\u003c\/strong\u003e \u003cspan data-mce-fragment=\"1\"\u003eAnric Technologies was founded in 2014 by researchers from Harvard University to address the gap in the market for benchtop ALD tools designed and optimized for small samples and small budgets.\u003c\/span\u003e\u003c\/em\u003e\u003c\/p\u003e\n\u003cp data-mce-fragment=\"1\"\u003e\u003cem data-mce-fragment=\"1\"\u003e\u003cstrong data-mce-fragment=\"1\"\u003eMSE Supplies\u003c\/strong\u003e\u003cspan data-mce-fragment=\"1\"\u003e \u003c\/span\u003eis an authorized distributor of\u003cspan data-mce-fragment=\"1\"\u003e \u003c\/span\u003e\u003cstrong data-mce-fragment=\"1\"\u003eAnric Technologies \u003c\/strong\u003efor USA and Canada. \u003c\/em\u003e\u003c\/p\u003e\n\u003cstyle type=\"text\/css\"\u003e\u003c!--\ntd {border: 1px solid #cccccc;}br {mso-data-placement:same-cell;}\n--\u003e\u003c\/style\u003e","brand":"Anric Technologies","offers":[{"title":"Default Title","offer_id":40117640495162,"sku":"AN-AT410","price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/files\/anric-technologies-benchtop-atomic-layer-deposition-ald-system-at410-default-title-anric-technologies-laboratory-coaters-22271584895034.png?v=1752497239"},{"product_id":"anric-technologies-benchtop-plasma-atomic-layer-deposition-ald-system-at650p","title":"Anric Technologies Benchtop Plasma Atomic Layer Deposition (ALD) System AT650P","description":"\u003cp\u003e\u003cspan\u003eSKU#: AN-AT650P\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003eAtomic Layer Deposition (ALD) is a powerful thin-film deposition technique. Compared to traditional Chemical Vapor Deposition (CVD), ALD allows even higher quality surface layer with pinhole-free, excellent uniformity and conformal (coating even the backside, filling holes even in porous substrates and powders). These advantages are related to its controllable process. The whole process is continuous and self-limiting, which means the material in the chamber is slowly deposited by a precursor separately in single atomic layer at a time and the steps are repeated until achieving desired thickness. It is widely used in electronic, biomedical, photovoltaic and other applications.\u003c\/p\u003e\n\u003cp\u003ePlasma ALD (PE-ALD) allows for:\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eFaster deposition rates and\/or lower deposition temperatures.\u003c\/li\u003e\n\u003cli\u003eImproved film properties: density, adhesion and crystallinity.\u003c\/li\u003e\n\u003cli\u003eCompatibility with a broader range of precursors.\u003c\/li\u003e\n\u003cli\u003eBetter control of thin film material properties (percent oxygen\/nitrogen, etc..).\u003c\/li\u003e\n\u003cli\u003eAllows for the more efficient pre-cleaning of surfaces (oxygen plasma).\u003c\/li\u003e\n\u003cli\u003eDeposition of metals by using forming gas or hydrogen plasma.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cstrong\u003eMSE Supplies\u003c\/strong\u003e offers the Benchtop Plasma Atomic Layer Deposition System AT650P from Anric Technologies. \u003c\/p\u003e\n\u003cp\u003eThe AT650P is the most cost-effective thermal ALD tool on the market with customizable chucks\/platen. It is specially designed for simple operation and installation with a focus on research and development labs, where small size and cost effectiveness are the largest concerns.\u003c\/p\u003e\n\u003cp\u003eAT650P has fast cycling capability (up to 1.2nm\/min Al\u003csub\u003e2\u003c\/sub\u003eO\u003csub\u003e3\u003c\/sub\u003e) and high exposure, deep penetration processing available. It has smallest footprint on market, bench top installation and cleanroom compatible. \u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eCountry of Origin:\u003c\/strong\u003e Made in USA\u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eManufacturer:\u003c\/strong\u003e Anric Technologies\u003c\/p\u003e\n\u003ch3\u003e\u003cstrong\u003eMain Features:\u003c\/strong\u003e\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eSmall footprint \u003cspan data-mce-fragment=\"1\"\u003e(~ 15 \u003c\/span\u003e\u003cspan data-mce-fragment=\"1\"\u003ein\u003c\/span\u003e\u003csup data-mce-fragment=\"1\"\u003e3\u003c\/sup\u003e\u003cspan data-mce-fragment=\"1\"\u003e or 38.1 cm\u003c\/span\u003e\u003csup data-mce-fragment=\"1\"\u003e3\u003c\/sup\u003e\u003cspan data-mce-fragment=\"1\"\u003e)\u003c\/span\u003e\n\u003c\/li\u003e\n\u003cli\u003eNow with a new advanced hollow cathode source\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cul\u003e\n\u003cul\u003e\n\u003cli\u003eFeaturing: low oxygen contamination (in nitrides, etc..), high electron density, low plasma damage\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/ul\u003e\n\u003cul\u003e\n\u003cli\u003eSemiconductor-grade metal sealed lines and high temperature compatible fast pulsing ALD valves.\u003c\/li\u003e\n\u003cli\u003eUltrafast MFC for integrated inert gas purge.\u003c\/li\u003e\n\u003cli\u003e6″ circular chuck customizable for smaller sizes or other shapes..\u003c\/li\u003e\n\u003cli\u003e4 organometallic precursors (3 heated to 185 °C) and 2 (up to 4) counter reactants.\u003c\/li\u003e\n\u003cli\u003eHeated lines throughout (from precursor to chamber).\u003c\/li\u003e\n\u003cli\u003eSubstrate temperature to 400°C\u003c\/li\u003e\n\u003cli\u003e10″ touchscreen PLC controller (no PC required)\u003c\/li\u003e\n\u003cli\u003e1 year warranty (non-consumable parts and labor included). \u003c\/li\u003e\n\u003cli\u003e3 years process support\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003e\u003cstrong\u003eOptions:\u003c\/strong\u003e\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eCustomized chuck\/platen (square, indents for smaller pieces, powders)\u003c\/li\u003e\n\u003cli\u003eQCM (Quartz Crystal Microbalance)\u003c\/li\u003e\n\u003cli\u003eGlovebox integration or load lock (typically required to not expose substrate to moisture; oxygen, etc..)\u003c\/li\u003e\n\u003cli\u003eExternal control – PC\/software link (allows programing and running, remotely)\u003c\/li\u003e\n\u003cli\u003eBubblers and\/or larger capacity precursor bottles\u003c\/li\u003e\n\u003cli\u003eTwo additional counter-reactant lines\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cstrong style=\"font-size: 0.875rem;\" data-mce-style=\"font-size: 0.875rem;\"\u003ePlease \u003cspan style=\"text-decoration-line: underline;\" data-mce-style=\"text-decoration-line: underline;\"\u003e\u003ca href=\"https:\/\/www.msesupplies.com\/pages\/contact-us\" data-mce-fragment=\"1\" data-mce-href=\"https:\/\/www.msesupplies.com\/pages\/contact-us\" target=\"_blank\"\u003e\u003cem data-mce-fragment=\"1\" data-mce-style=\"font-weight: bold;\"\u003econtact us\u003c\/em\u003e\u003c\/a\u003e\u003c\/span\u003e for vacuum pump options.\u003c\/strong\u003e\u003c\/p\u003e\n\u003ch3\u003eSpecifications:\u003c\/h3\u003e\n\u003ctable style=\"font-weight: 400; height: 244px;\" width=\"547\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 35px;\" data-mce-style=\"height: 35px;\"\u003e\n\u003ctd style=\"height: 35px; width: 182.614px;\" data-mce-style=\"height: 35px; width: 182.614px;\"\u003e\n\u003cp\u003eChamber temperatures\u003cbr\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd style=\"height: 35px; width: 352.159px;\" data-mce-style=\"height: 35px; width: 352.159px;\"\u003e\n\u003cp\u003eRT to 400°C ± 1 °C\u003cbr\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 55px;\" data-mce-style=\"height: 55px;\"\u003e\n\u003ctd style=\"height: 55px; width: 182.614px;\" data-mce-style=\"height: 55px; width: 182.614px;\"\u003e\n\u003cp\u003e\u003cspan\u003ePrecursor temperatures\u003c\/span\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd style=\"height: 55px; width: 352.159px;\" data-mce-style=\"height: 55px; width: 352.159px;\"\u003e\n\u003cp\u003eRT to 185°C ± 2°C (w\/ heating jacket)\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 39px;\" data-mce-style=\"height: 39px;\"\u003e\n\u003ctd style=\"height: 39px; width: 182.614px;\" data-mce-style=\"height: 39px; width: 182.614px;\"\u003eVacuum Pumping (min)\u003c\/td\u003e\n\u003ctd style=\"height: 39px; width: 352.159px;\" data-mce-style=\"height: 39px; width: 352.159px;\"\u003e19.5 cfm wet pump is required\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 19px;\" data-mce-style=\"height: 19px;\"\u003e\n\u003ctd style=\"height: 19px; width: 182.614px;\" data-mce-style=\"height: 19px; width: 182.614px;\"\u003eDimensions\u003c\/td\u003e\n\u003ctd style=\"height: 19px; width: 352.159px;\" data-mce-style=\"height: 19px; width: 352.159px;\"\u003e23” (586mm) wide, 31” (787mm) deep, 38” (965mm) tall\u003cbr\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 19px;\" data-mce-style=\"height: 19px;\"\u003e\n\u003ctd style=\"height: 19px; width: 182.614px;\" data-mce-style=\"height: 19px; width: 182.614px;\"\u003eWeight\u003c\/td\u003e\n\u003ctd style=\"height: 19px; width: 352.159px;\" data-mce-style=\"height: 19px; width: 352.159px;\"\u003e~100lb (45kg)\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 19px;\" data-mce-style=\"height: 19px;\"\u003e\n\u003ctd style=\"height: 19px; width: 182.614px;\" data-mce-style=\"height: 19px; width: 182.614px;\"\u003eRequired Power\u003c\/td\u003e\n\u003ctd style=\"height: 19px; width: 352.159px;\" data-mce-style=\"height: 19px; width: 352.159px;\"\u003e110-120 VAC, single phase, 50\/60Hz; 15Amp\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cul\u003e\u003c\/ul\u003e\n\u003cp data-mce-fragment=\"1\"\u003e\u003cem data-mce-fragment=\"1\"\u003e\u003cstrong data-mce-fragment=\"1\"\u003e\u003cb data-mce-fragment=\"1\"\u003eAbout Anric Technologies:\u003c\/b\u003e\u003c\/strong\u003e \u003cspan data-mce-fragment=\"1\"\u003eAnric Technologies was founded in 2014 by researchers from Harvard University to address the gap in the market for benchtop ALD tools designed and optimized for small samples and small budgets.\u003c\/span\u003e\u003c\/em\u003e\u003c\/p\u003e\n\u003cp data-mce-fragment=\"1\"\u003e\u003cem data-mce-fragment=\"1\"\u003e\u003cstrong data-mce-fragment=\"1\"\u003eMSE Supplies\u003c\/strong\u003e\u003cspan data-mce-fragment=\"1\"\u003e \u003c\/span\u003eis an authorized distributor of\u003cspan data-mce-fragment=\"1\"\u003e \u003c\/span\u003e\u003cstrong data-mce-fragment=\"1\"\u003eAnric Technologies \u003c\/strong\u003efor USA and Canada. \u003c\/em\u003e\u003c\/p\u003e\n\u003cstyle type=\"text\/css\"\u003e\u003c!--\ntd {border: 1px solid #cccccc;}br {mso-data-placement:same-cell;}\n--\u003e\u003c\/style\u003e","brand":"Anric Technologies","offers":[{"title":"Default Title","offer_id":40299304714298,"sku":"AN-AT650P","price":0.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/files\/anric-technologies-benchtop-plasma-atomic-layer-deposition-ald-system-at650p-default-title-anric-technologies-laboratory-coaters-22271471419450.png?v=1752499475"}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0722\/7785\/collections\/Atomic_Layer_Deposition_Equipment.jpg?v=1769048836","url":"https:\/\/www.msesupplies.com\/collections\/atomic-layer-deposition-ald-equipment\/atomic-layer-deposition-systems.oembed","provider":"MSE Supplies","version":"1.0","type":"link"}